Morphology enhancement of SiO_(2)aerogel films grown on Si substrate using dense SiO_(2)buffer layer  

作　　者：Xiang-Yu Sun Chuan-Gui Wu Wen-Bo Luo Yao Shuai Wang-Li Zhang 

机构地区：[1]State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China,Chengdu,610054,China

出　　处：《Rare Metals》2023年第7期2457-2461,共5页稀有金属（英文版）

基　　金：financially supported by the National Natural Science Foundation of China(No.51102037);the Fundamental Research Funds for the Central Universities from UESTC(Nos.ZYGX2010J030 and ZYGX2011J023)。

摘　　要：Porous SiO_(2)film has been widely studied due to its extensive applications in many fields.This paper presents a newly produced porous SiO_(2)film made by traditional sol-gel method.Bare Si and Si with SiO_(2)buffer layer were used as substrate.The SiO_(2)buffer layer was 500 nm in thickness and was grown by thermal oxidization.The structural properties of SiO_(2)aerogel films spincoated on both materials were observed by optical microscope(OM)and scanning electron microscope(SEM).Results reveal that the surface of SiO_(2)aerogel films on bare Si is rough and discontinuous.While flat and smooth surface is observed on sample with SiO_(2)buffer layer.This indicates that by inserting SiO_(2)buffer layer,the structural property of SiO_(2)aerogel film deposited on Si is improved.

关 键 词：SiO_(2)aerogel film Si substrate SiO_(2)buffer layer Surface morphology 

分 类 号：TQ427.26[化学工程] TB383.2[一般工业技术—材料科学与工程]