Low-pressure-RF plasma modification of UiO-66 and its application in methylene blue adsorption  

作　　者：周甜 杨斗豪 王一骏 程久珊 陈强 刘博文 刘忠伟 Tian ZHOU;Douhao YANG;Yijun WANG;Jiushan CHENG;Qiang CHEN;Bowen LIU;Zhongwei LIU(Laboratory of Plasma Physics and Materials,Beijing Institute of Graphic Communication,Beijing 102600,People's Republic of China)

机构地区：[1]Laboratory of Plasma Physics and Materials,Beijing Institute of Graphic Communication,Beijing 102600,People's Republic of China

出　　处：《Plasma Science and Technology》2023年第8期122-129,共8页等离子体科学和技术（英文版）

基　　金：financially supported by National Natural Science Foundation of China(Nos.12075032 and 12105021);the Natural Science Foundation of Beijing Municipality(Nos.KZ202010015022 and 8222055);the Yunnan Police College Project(Nos.YNPC-S2021002 and YJKF002);Beijing Institute of Graphic Communication Project(Nos.Ec202207 and S202210015021)。

摘　　要：Defect engineering of metal-organic frameworks has attracted increasing attention in recent years for potential applications in gas storage and catalysis.In this study,defective UiO-66 is obtained by Ar and H_(2)plasma treatments.Compared with the pristine UiO-66,a new aperture with a size of~4 nm appears for a sample with the plasma modification,indicating the formation of mesopores within UiO-66 framework.Characterization results demonstrate that the pore volume,surface area and the number of Lewis and Br?nsted acid sites can be easily tuned by varying the discharge parameters.The adsorption performance of UiO-66 is evaluated for the adsorption of methyl blue.In comparison to the pristine UiO-66 and the sample with H_(2)plasma treatment,the Ar plasma modified sample shows excellent adsorption activity due to the suitable pore size and volume.Equilibrium adsorption capacity as high as 40.6 mg·g^(-1)is achieved for the UiO-66(Ar)sample.

关 键 词：Ar plasma UiO-66 DEFECTS metal-organic frameworks 

分 类 号：O53[理学—等离子体物理] O647.3[理学—物理]