基于硅基MEMS工艺的快速控制反应镜制作  

Fabrication of fast steering mirror by Si-MEMS process

作　　者：王平[1] 代锋[1] 杨士成 WANG Ping;DAI Feng;YANG Shicheng(China Academy of Space Technology(Xi’an),Xi’an 710000,China)

机构地区：[1]中国空间技术研究院西安分院,西安710000

出　　处：《空间电子技术》2023年第4期91-97,共7页Space Electronic Technology

摘　　要：快速控制反应镜(以下简称快反镜)是光电精密跟踪系统中必不可少的组成部分,在消费电子、医疗、天文望远镜、激光通信等领域中有着广泛应用。基于硅基微电子机械系统(micro-electromechanical system,MEMS,)工艺制作微型快反镜,对于实现快反镜和跟踪系统的小型化、轻量化有重要意义。陈述了一款硅基快反镜的结构设计、工艺选择以及制作攻关过程。通过加工便利性、加工精度、加工可靠性与制作成本的综合分析比较,确定了MEMS深硅刻蚀工艺制作小型化快反镜可动结构技术思路。快反镜的制作中,通过“化面为线”的版图优化减少刻蚀面积解决了深硅刻蚀不匀问题,通过清洗方法的对比和择优解决了反射镜面表面清洁度问题,通过改变金属化方法解决了镜面的面形精度控制问题。测试结果表明,此款基于硅基MEMS工艺的小型化快反镜满足了设计和应用需求。Fast steering mirrors(FSM)are an essential component of optoelectronic precision tracking systems and are widely used in consumer electronics,medical,astronomical telescopes and laser communications.The fabrication of a micro-electromechanical system(MEMS)based on silicon is important for the miniaturization and lightweighting of the mirror and tracking system.This paper presents the structural design,process selection and fabrication process of a silicon-based mirror.Through a comprehensive analysis of processing convenience,processing accuracy,processing reliability and fabrication cost.Technical ideas of a movable structure for miniaturised fast-reflector by MEMS deep silicon etching process is determined.In the fabrication of the mirror,the problem of uneven deep silicon etching was solved by reducing the etched area through the“surface to line”layout optimization,the problem of surface cleanliness of the mirror was solved through the comparison and selection of cleaning methods,and the problem of surface shape accuracy control of the mirror was solved by changing the metallization method.The test results show that this miniaturised fast reflective mirror based on the silicon-based MEMS process meets the requirements of the design and application.

关 键 词：硅基MEMS 工艺 快反镜 深硅刻蚀 

分 类 号：V464[航空宇航科学与技术—航空宇航制造工程]