ChCl-Urea低共熔溶剂中Zn-Ni合金的电沉积行为研究  

Study on the Electrochemical Behavior of Zn-Ni Alloy Coating in ChCl-Urea Deep Eutectic Solvent

作　　者：王健 刘杰 赵鹤 崔家宁 坝媛 孙海静 谭勇[1] 孙杰[1] WANG Jian;LIU Jie;ZHAO He;CUI Jianing;BA Yuan;SUN Haijing;TAN Yong;SUN Jie(Shenyang Ligong University,Shenyang 110159,China)

机构地区：[1]沈阳理工大学环境与化学工程学院,沈阳110159

出　　处：《沈阳理工大学学报》2023年第5期56-61,共6页Journal of Shenyang Ligong University

基　　金：辽宁省教育厅青年科技人才“育苗”项目(LG201928);辽宁省沈阳材料科学国家研究中心联合研发基金项目(2019JH3/30100021);沈阳理工大学大学生创新创业训练计划项目(S202110144001)。

摘　　要：以氯化胆碱-尿素(ChCl-Urea)为溶剂,研究Zn-Ni合金的电沉积行为。采用计时安培法和循环伏安法对Zn-Ni合金的电沉积机理进行研究,采用扫描电子显微镜/能谱仪(SEM/EDS)和X射线衍射仪(XRD)对镀层的微观形貌、元素组成和物相组成进行表征。分析结果表明:Zn-Ni合金在ChCl-Urea低共熔溶剂中的成核机理符合三维瞬时成核;Zn比Ni后沉积,其过程是受扩散控制下的不可逆还原反应过程;该体系下可制得致密、呈菜花结构的镀层,Zn的含量高于Ni。The electrodeposition behavior of Zn-Ni alloy is studied using choline chloride u-rea(ChCl-Urea)as solvent.The mechanism of electrodeposition Zn-Ni alloy is studied by chronoamperometry and cyclic voltammetry,and the micro morphology,element composi-tion and phase composition of the coating are characterized by scanning electron microscopy(SEM/EDS)and X-ray diffraction(XRD).The results show that the nucleation mechanism of Zn-Ni alloy in ChCl-Urea eutectic solvent conforms to three-dimensional instantaneous nucleation,and Zn deposits later than Ni,and the process is an irreversible reduction reaction controlled by diffusion,in this system,a dense Zn-Ni alloy coating with cauliflow er structure is successfully prepared,and the content of Zn is higher than that of Ni.

关 键 词：低共熔溶剂 ZN-NI合金 电沉积 

分 类 号：TQ153.16[化学工程—电化学工业]