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作 者:Zhaoqiang Zou Jinkai Xu Wanfei Ren
机构地区:[1]Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing,Changchun University of Science and Technology,Changchun 130022,China [2]School of Mechanical and Electrical Engineering,Changchun University of Science and Technology,Changchun 130022,China
出 处:《Nanomanufacturing and Metrology》2023年第2期27-36,共10页纳米制造与计量(英文)
基 金:supported by The National Key Research and Development Program of China(2022YFB4600202);Applied Basic Research Project of Key R&D Program of Changchun Science and Technology Bureau(21ZY37);The Fund for the Central Government Guides Local Science and Technology Development Funds to the Special Basic Research of Jilin Province(No.202002039JC);Jinlin Innovation and Entrepreneurship Talent Funding Project(No.2021Z002)。
摘 要:Re-entrant structures have drawn increasing attention because of their hydrophobicity.However,it is very difficult to manufacture re-entrant structures at the micron scale on metal surfaces.In this study,we designed and manufactured novel hollow re-entrant structures employing laser ablation and electrodeposition technology.This designed hollow re-entrant structure on metal surfaces has been fabricated successfully,which has high processing efficiency and good repeatability.The morphology and size of the hollow re-entrant structures were characterized.We found that the hydrophobic performance of hollow re-entrant structures was improved after being in the atmosphere for 3 days.After electrodeposition,the static contact angle was 133°.However,after being placed in the atmosphere for 3 days,the static contact angle was 140.4°,which is 5.2%higher than that after electrochemical deposition.We explained the cause of this phenomenon.The change of element content on the surface of hollow re-entrant structures was used to indicate the formation of metal oxide.After being in the atmosphere for 3 days,oxygen content increased by 0.4%.The metal surfaces with hollow re-entrant structures have a broader application prospect.
关 键 词:Hollow re-entrant structures ELECTRODEPOSITION Hydrophobic surface
分 类 号:TB383[一般工业技术—材料科学与工程]
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