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作 者:王皓北 WANG Hao-bei(The 27th Research Institute of China Electronics Technology Group Corporation,Zhengzhou 450047,China)
机构地区:[1]中国电子科技集团公司第二十七研究所,郑州450047
出 处:《电光系统》2023年第2期51-54,共4页Electronic and Electro-optical Systems
摘 要:锗量子点(QD)光探测器(PD)是在锗衬底上制造的,在400~1550nm范围内表现出宽带、可见光到近红外光反应。获得了高达1.12A/W的室温光谱响应度(Rsp)和313%的内部量子效率(IQE),优于传统的硅和锗光二极管。降低工作温度和入射功率导致性能急剧增强,在T=100K,波长为1550nm,入射功率为10nW时,IQE=1000%。基于其简单的制造和硅技术的兼容性,这些锗QDPD代表了宽带、高性能可见光到近红外检测的一个有前途的选择.Ge quantum dot(QD)photodetectors(PD)were fabricated on Ge substrates,exhibiting a broadband and visible to near-IR photoresponse in the 400~1550 nm range.Room-temperature responsivities(Rsp)up to 1.12 A/W and internal quantum efficiency(IQE)of 313%were obtained,superior to conventional Si and Ge photodiodes.Reducing the operating temperature and incident power led to a sharp increase in performance.When T was 100 K,wavelength of 1550nm,and incident power of 10 nW,the IQE was 1000%.Based on their simple fabrication and Si technology compatibility,these Ge QD PDs represent a promising alternative for broadband and high-performance visible to near-IR detection.
分 类 号:TN36[电子电信—物理电子学]
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