集成电路用硅基材料分离纯化技术的应用研究进展  

Research Progress on the Application of Separation and Purification Technology in Silicon-containing Materials for Integrated Circuits

作　　者：袁振军 常欣 刘见华 赵雄 万烨[1,2,3] YUAN Zhenjun;CHANG Xin;LIU Jianhua;ZHAO Xiong;WAN Ye

机构地区：[1]洛阳中硅高科技有限公司,河南洛阳471023 [2]硅基材料制备技术国家工程研究中心,河南洛阳471023 [3]中国恩菲工程技术有限公司,北京100038

出　　处：《绿色矿冶》2023年第4期61-65,共5页Sustainable Mining and Metallurgy

摘　　要：硅基材料是集成电路制程中的关键材料之一,广泛应用于外延、化学气相沉积、离子注入、掺杂、刻蚀、清洗、掩蔽膜生成等工艺。硅基材料的纯度直接影响着集成电路的性能、集成度、成品率。文章阐述了在集成电路用硅基材料中应用较多的分离纯化技术的原理与应用进展,包括吸附精馏、络合精馏、亚沸精馏、减压精馏、光氯化、循环过滤等,比对了各种分离纯化技术的优缺点,并对硅基材料提纯的前景进行了分析和展望。Silicon-based materials are one of the key materials in integrated circuit processes,which are widely used in epitaxy,chemical vapor deposition,ion implantation,doping,etching,cleaning,and mask generation and other processes.The purity of silicon-based materials directly affects the performance,integration and yield of integrated circuits.In this paper,the principle and application progress of separation and purification technologies which are widely used in silicon-based materials for integrated circuits were described,including adsorption distillation,complexation distillation,sub-boiling distillation,vacuum distillation,photochlorination,cyclic filtration,etc.The advantages and disadvantages of various separation and purification technologies were compared,and the prospect of purification of silicon-based materials was analyzed and prospected.

关 键 词：分离纯化 吸附 络合 亚沸精馏 减压精馏 光氯化 集成电路 硅基材料 

分 类 号：TQ264.1[化学工程—有机化工]