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作 者:邵尚坤 李惠泉 袁天语 孙学鹏 华路 刘志国 孙天希 Shangkun Shao;Huiquan Li;Tianyu Yuan;Xuepeng Sun;Lu Hua;Zhiguo Liu;Tianxi Sun(Key Laboratory of Beam Technology of the Ministry of Education,College of Nuclear Science and Technology,Beijing Normal University,Beijing 100875,China;Institute of Radiation Technology,Beijing Academy of Science and Technology,Beijing 100875,Chin)
机构地区:[1]Key Laboratory of Beam Technology of the Ministry of Education,College of Nuclear Science and Technology,Beijing Normal University,Beijing 100875,China [2]Institute of Radiation Technology,Beijing Academy of Science and Technology,Beijing 100875,Chin
出 处:《Chinese Physics B》2023年第8期247-250,共4页中国物理B(英文版)
基 金:Project supported by the National Key Research and Development Program of China(Grant No.2021YFF0701202);the National Natural Science Foundation of China(Grant No.11875087)。
摘 要:Glancing incidence x-ray fluorescence spectrometry using a single-bounce parabolic capillary is proposed for the analysis of layered samples.The divergence of the x-ray beam was 0.33 mrad.In this paper,we used this instrumental setup to analyze a Si single crystal and a 50 nm HfO_(2) single-layer film deposited on a Si substrate.
关 键 词:single-bounce parabolic capillary glancing incident x-ray fluorescence(GIXRF) atomic layer deposition film analysis
分 类 号:TB383.2[一般工业技术—材料科学与工程] O657.34[理学—分析化学]
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