滚镀碱性锌镍合金低电区沉积速率改善方案的探讨  

Investigation on the improvement scheme of deposit speed in LCD area of barrel alkaline Zn-Ni process

作　　者：赵明 汪长 方代号 王兆成 肖娜 宫尚霞 张培培 Zhao Ming;Wang Chang;Fang Daihao;Wang Zhaocheng;Xiao Na;Gong Shangxia;Zhang Peipei(Shanghai Rensheng Standard Parts Co.,Ltd.,Shanghai 201412,China;Atotech(China)Chemicals Co.,Ltd.,Shanghai Qingpu Branch,Shanghai 201707,China)

机构地区：[1]上海仁盛标准件制造有限公司,上海201412 [2]安美特(中国)化学有限公司上海青浦分公司,上海201707

出　　处：《电镀与精饰》2023年第9期78-84,共7页Plating & Finishing

摘　　要：为了有效改善滚镀碱性锌镍合金低电区沉积速率,采用赫尔槽数据以及电化学理论进行分析,并结合电镀生产现场实际状况,重点从锌浓度、氢氧化钠浓度、镀液温度、络合剂浓度方面对赫尔槽试片高、低区厚度分布影响进行分析,确定最佳参数后,在生产线上隔离出单独的镀槽和溶锌槽配制相应镀液,并用同种工件、同电流密度和相同的电镀时间进行对比验证,对比锌镍镀层低区厚度、外观及延展性(通过拉铆装配来进行判定),结果表明滚镀锌镍合金要想在低电流密度区获得较理想的镀层,需要适当的金属锌浓度、温度、络合剂相互配合。This article focus on improving the deposition rate in LCD area of alkaline barrel Zn-Ni plating.Through the analysis of Hull cell data and electrochemical theory,and in combination with the actual situation of electroplating production site,it focuses on the analysis of the influence of Zn concentration,sodium hydroxide concentration,bath temperature,complexing agent concentration,on the thickness distribution in the HCD and LCD areas of Hull Cell test panels.After determining the best parameters,isolate the separated Zn-Ni plating tank and Zn dissolving tank on the production line to prepare the corresponding Zn-Ni plating bath,compare and verify with the rest of plating stations on the Zn-Ni production line with the same current density and plating time.The results show that in order to obtain an ideal Zn-Ni deposit layer in the low current density area,proper Zn concentration,temperature and complexing agent are required.

关 键 词：电镀 锌镍合金 高电流密度区 低电流密度区 沉积速率 拉铆 盲孔件 

分 类 号：TQ153[化学工程—电化学工业]