大气压等离子体射流放电参数对沉积氧化钛薄膜特性的影响  

Effect of Atmospheric Pressure Plasma Jet Discharge Parameters on the Characteristics of Deposited Titanium Oxide Films

作　　者：邓成志 韩若愚 连秀云 冯娟 张天亮 李琛 欧阳吉庭[1] DENG Chengzhi;HAN Ruoyu;LIAN Xiuyun;FENG Juan;ZHANG Tianliang;LI Chen;OUYANG Jiting(School of Physics,Beijing Institute of Technology,Beijing 100081,China)

机构地区：[1]北京理工大学物理学院,北京100081

出　　处：《石油学报（石油加工）》2023年第5期1070-1081,共12页Acta Petrolei Sinica(Petroleum Processing Section)

基　　金：国家自然科学基金项目(52077006);北京市自然科学基金项目(7232332)资助。

摘　　要：大气压等离子体增强化学气相沉积(AP-PECVD)功能薄膜技术受到广泛的关注,但等离子体的作用机理仍有待进一步探讨。利用针-板电极大气压电晕Ar等离子体射流,在不同放电频率条件下,对单、双脉冲的放电参数及沉积TiO_(2)薄膜的性质进行比较,阐明了脉冲放电特性对等离子体参数和TiO_(2)薄膜生长的影响,进而推断AP-PECVD中等离子体的作用机理。结果表明:单个电压周期内,放电电流呈稳定的单脉冲或双脉冲,电晕等离子体射流区域呈均匀弥散分布,沉积的氧化钛薄膜均匀致密;其他条件相同的情况下,双脉冲放电极间平均耗散功率、等离子体气体温度大于单脉冲放电,并且等离子体区域发光显著增强,发射光谱计算得到大气压等离子体射流电子激发温度约8000 K,双脉冲等离子体射流电子温度略高于单脉冲等离子体射流。对于薄膜生长,双脉冲放电薄膜沉积速率比单脉冲放电大,沉积的薄膜更加致密,亲水性更强。由于等离子体参数上的差异,在钛酸异丙酯解离过程和TiO_(2)薄膜形成时的表面扩散过程中,双脉冲等离子体射流比单脉冲射流贡献更大,有利于快速沉积更致密、亲水性更高的氧化钛薄膜。Atmospheric pressure plasma enhanced chemical vapor deposition(AP-PECVD)functional film technology has received wide attention,but the mechanism of action of plasma remains to be further explored.In this study,the single-pulse and double-pulse discharge parameters and the properties of deposited TiO_(2)films were compared by using pin-plate electrode atmospheric corona Ar plasma jet at different discharge frequencies,the effects of pulse discharge characteristics on the plasma parameters and TiO_(2)film growth were clarified,and then the mechanism of action of plasma in AP-PECVD was deduced.The results show that in a single voltage period,the discharge current presents a stable single or double pulse,the corona plasma jet region is uniformly dispersed,and the deposited titanium oxide film is uniformly dense.Under the same other conditions,the average power dissipation between the electrodes of the double-pulse discharge and the gas temperature of the plasma are greater than those of the single-pulse discharge,and the luminescence in the plasma region is significantly enhanced;based on emission spectroscopy,the electron excitation temperature of the atmospheric pressure plasma jet is calculated as being about 8000 K,and the electron temperature of the double-pulse plasma jet is slightly higher than that of the single-pulse plasma jet.For film growth,the deposition rate of double-pulse discharge film is higher than that of single-pulse discharge film,and the deposited film is more dense and more hydrophilic.Due to the difference in plasma parameters,compared with single-pulse plasma jet,double-pulse plasma jet can make a greater contribution to the dissociation of titanium tetraisopropoxide and the surface diffusion during the formation of TiO_(2)film,which is conducive to the rapid deposition of denser and more hydrophilic titanium oxide film.

关 键 词：大气压等离子体射流 多脉冲放电 TiO_(2)薄膜沉积 发射光谱法 电晕放电 

分 类 号：O469[理学—凝聚态物理]