离子溅射仪油雾污染对溅射基底的影响  

Influence of Oil Mist Pollution on Sputtering Substrate of Ion Sputtering Instrument

作　　者：彭波 袁秋 孟晓敏 PENG Bo;YUAN Qiu;MENG Xiao-min(Coating Business Department,Chongqing Anmei Technology Co.,Ltd.,Chongqing 400707,China;Chongqing Vocational and Technical University of Mechatronics,Chongqing 402760,China;Science And Technology R&D Center Chongqing Nobel 2D Materials Research Institute Co.,Ltd.,Chongqing 400799,China)

机构地区：[1]重庆安美科技有限公司镀膜事业部,重庆400707 [2]重庆机电职业技术大学机械工程学院,重庆402760 [3]重庆诺奖二维材料研究院有限公司科技研发中心,重庆400799

出　　处：《真空》2023年第4期13-17,共5页Vacuum

摘　　要：利用光学显微镜、场发射扫描电子显微镜、原子力显微镜以及能谱仪研究了油雾污染对溅射基底(硅片、称量纸、铜箔和载玻片)微观形貌和元素含量的影响。结果表明:溅射沉积不同时间后,硅片基底上均出现球状颗粒,且颗粒随着溅射时间延长而聚集或长大;溅射前硅片的碳含量为4.55%,经溅射沉积50s后其表面碳含量约为31.55%;铜箔和称量纸溅射沉积50s后的光学形貌与溅射前差异不大,未出现球状颗粒;载玻片溅射沉积50s的光学形貌与硅片的接近,表面随机分布着球状颗粒。硅基类基底对油雾污染极其敏感,表现为经过溅射处理后样品表面分布着球状颗粒,且碳元素质量分数约为溅射前的7~8倍。The effect of oil mist pollution on micromorphology and element content of sputtered substrate(silicon wafer,weighing paper,copper foil and glass slide)was studied through optical microscope,field emission scanning electron microscope,energy spectrometer and atomic force microscope.The results show that after sputtering deposition for different times,spherical particles appear on the silicon substrate,and the particles gather or grow with the increase of sputtering time.The carbon content of silicon wafer before sputtering is 4.55%,and it rises to about 31.55%after 50s of sputtering deposition.The optical morphology of copper foil and weighing paper after sputtering deposition for 50s has little difference from the sample before sputtering,and there is no spherical particle.The optical morphology of glass slide after sputtering deposition for 50s is similar to that of the silicon slide,spherical particles are randomly distributed on the surface.The silicon substrate is extremely sensitive to oil mist pollution,which is characterized by spherical particles distributed on the surface of the sample after sputtering treatment,and the mass fraction of carbon is about 7-8 times of that before sputtering.

关 键 词：离子溅射仪 油雾分子 基底 球状颗粒 

分 类 号：TN16[电子电信—物理电子学] TB321[一般工业技术—材料科学与工程]