Intercalation of hafnium oxide between epitaxially-grown monolayer graphene and Ir(111)substrate  

作　　者：表奕 路红亮 彭浩 宋志朋 郭辉 林晓 Yi Biao;Hong-Liang Lu;Hao Peng;Zhi-Peng Song;Hui Guo;Xiao Lin(University of Chinese Academy of Sciences and Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China)

机构地区：[1]University of Chinese Academy of Sciences and Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China

出　　处：《Chinese Physics B》2023年第9期506-509,共4页中国物理B（英文版）

基　　金：the Ministry of Science and Technology of China(Grant Nos.2018YFA0305800 and2019YFA0308500);the National Natural Science Foundation of China(Grant No.61925111);the Chinese Academy of Sciences(Grant Nos.XDB28000000 and YSBR-003);the Fundamental Research Funds for the Central Universities;the CAS Key Laboratory of Vacuum Physics。

摘　　要：Intercalation of insulating materials between epitaxial graphene and the metal substrates is highly demanded to restore the intrinsic properties of graphene,and thus essential for the graphene-based devices.Here we demonstrate a successful solution for the intercalation of hafnium oxide into the interface between full-layer graphene and Ir(111)substrate.We first intercalate hafnium atoms beneath the epitaxial graphene.The intercalation of the hafnium atoms leads to the variation of the graphene moire superstructure periodicity,which is characterized by low-energy electron diffraction(LEED)and lowtemperature scanning tunneling microscopy(LT-STM).Subsequently,we introduce oxygen into the interface,resulting in oxidization of the intercalated hafnium.STM and Raman's characterizations reveal that the intercalated hafnium oxide layer could effectively decouple the graphene from the metallic substrate,while the graphene maintains its high quality.Our work suggests a high-k dielectric layer has been successfully intercalated between high-quality epitaxial graphene and metal substrate,providing a platform for applications of large-scale,high-quality graphene for electronic devices.

关 键 词：epitaxial graphene HAFNIUM INTERCALATION OXIDIZATION 

分 类 号：O469[理学—凝聚态物理]