四波前横向剪切干涉仪的关键技术研究  

Key Technologies of Quadri-Wave Lateral Shearing Interferometer

作　　者：刘克 张孝天 钟慧 何飞 刘书豪 李艳秋 Liu Ke;Zhang Xiaotian;Zhong Hui;He Fei;Liu Shuhao;Li Yanqiu(Key Laboratory of Optoelectronic Imaging Technology and System,Ministry of Education,School of Optics and Photonics,Beijing Institute of Technology,Beijing 100081,China)

机构地区：[1]北京理工大学光电学院光电成像技术与系统教育部重点实验室,北京100081

出　　处：《光学学报》2023年第15期245-255,共11页Acta Optica Sinica

基　　金：国家自然科学基金(61975013,62175014);国家科技重大专项(2017ZX02101006-001)。

摘　　要：四波前横向剪切干涉(QWLSI)是一种精度高、动态范围大、分辨率高、抗干扰能力强的瞬态波前检测技术。本文结合国内外相关研究工作,重点阐述了本课题组在分束器件设计、多方向横向剪切干涉图处理、测量误差校准等QWLSI的关键技术研究方面取得的进展。以关键技术研究为基础,本课题组开发了QWLSI的原理装置,其绝对测量精度(RMS)达到0.0038λ(2.4 nm,λ=635 nm),重复测量精度(RMS)达到0.0004λ(0.25 nm,λ=635 nm)。QWLSI与商品化的夏克-哈特曼波前传感器的对比实验结果表明,两种仪器对含有第4~36项单项Zernike像差入射波前的测量结果基本一致。Significance As a significant optical precision measuring technology,optical interferometry is known for its wavelengthlevel measurement accuracy.As the industry calls for higher demands on measurement accuracy,the requirements on the sensing range of measurement methods are also increasingly wide.Additionally,due to the influence of human traffic,construction,and other factors,some measurement methods insensitive to environmental changes should be urgently proposed.These demands on the industry drive the development of optical interferometry.A lot of interference testing techniques have emerged in the development of optical interferometry.One of these techniques is lateral shearing interferometry which is common optical path interferometry and features a wide detection range and low need for environmental stability or coherence of the light source.As a result,this kind of interferometry has a variety of applications.The lateral shearing interferometry originated from the Ronchi test in 1923 with a history of one hundred years,it can be divided into double-beam lateral shearing interferometry and multi-beam lateral shearing interferometry.The double beam lateral shearing interferometry needs at least two interferograms with different shear directions to recover the full wavefront phase information.This is because the interferogram of double-beam lateral shearing interferometry only contains the wavefront phase information about the shear direction,while this problem is resolved by multi-beam lateral shearing interferometry.Through this technology,the wavefront can be copied into multiple wavefronts to different emission angles at the same time,and then a multi-beam lateral shear interferogram is formed over the overlapping region of the observation surface.Therefore,each interferogram contains information about the phase differences between the wavefronts in multiple shear directions.Thus,only one interferogram is necessary to recover the wavefront to be measured through technical steps such as phase extraction,p

关 键 词：光学检测 剪切干涉 衍射光栅 相位提取 波前重建 误差校准 

分 类 号：O436[机械工程—光学工程]