中红外复合网栅减反射微纳结构表面研究  

Surface of Mid-Infrared Composite Grid Antireflection Micro-Nanostructure

作　　者：钟楚怡 欧阳名钊 周岩[3] 任航 付跃刚 韩旭[1,2] 吴锦双[1,2] Zhong Chuyi;Ouyang Mingzhao;Zhou Yan;Ren Hang;Fu Yuegang;Han Xu;Wu Jinshuang(Key Laboratory of Optoelectric Measurement and Optical Information Transmission Technology,Ministry of Education,Changchun University of Science and Technology,Changchun 130022,Jilin,China;School of Optoelectronic Engineering,Changchun University of Science and Technology,Changchun 130022,Jilin,China;Tianjin Jinhang Institute of Technical Physics,Tianjin 300309,China)

机构地区：[1]长春理工大学光电测控与光信息传输技术教育部重点实验室,吉林长春130022 [2]长春理工大学光电工程学院,吉林长春130022 [3]天津津航技术物理研究所,天津300309

出　　处：《光学学报》2023年第16期344-355,共12页Acta Optica Sinica

基　　金：国家自然科学基金(61705018);吉林省教育厅科技基金(JJKH20210814KJ)。

摘　　要：减反射微纳结构表面具有宽光谱、宽角度抗反射的优异光学性能,在光电池、光探测领域有广阔的应用前景。但微纳结构表面的周期结构单元微小,容易受到外界环境影响而损伤。为增强微纳结构表面微纳结构单元的机械稳定性,提出并制备了复合网栅减反射微纳结构表面,在硅基底上构建氧化硅复合网栅结构,实现了对内部微纳结构单元的保护作用。经过光学反射率测试,所制备的复合网栅微纳结构表面在3~5μm宽谱段、0°~40°宽角度内的平均反射率小于4%。此外,利用胶带剥离法测试网栅结构对微纳结构的保护作用,实验结果表明,带有网栅结构的微纳结构形貌并未产生损伤且减反射性能保持良好,最终证明设计的网栅结构具有力学保护性能。该研究将有助于推动微纳结构表面在高精度光学探测领域内的应用。Objective The advancement of micro-nanostructures has gained significant traction owing to their superior broadband antireflective attributes,which span a broad range of incident angles.This progress has expanded their application in photocells and photodetectors.However,these structures often possess subwavelength structural characteristics and high aspect ratio to manage the wavefront distortion of the target light field.The diminutive size and high aspect ratio of these periodic structural units make their surface susceptible to environmental damage,thereby affecting their optical performance.This paper proposes an antireflective micro-nanostructure surface with a composite grid structure.This innovative approach enhances the mechanical stability and longevity of the micro-nanostructure surface without altering its original design and optical properties.Methods We successfully proposed and fabricated an antireflection micro-nanostructure surface with a composite grid.This involved constructing a silicon oxide composite grid on a silicon substrate to protect the internal micro-nanostructural units.The optical and mechanical properties of the composite grid structure were optimized using appropriate material selection,morphological characterization,and size parameters.Moreover,the stress distributions of the three types of grid structure under a fixed load were analyzed using finite element analysis software.Based on the results of this theoretical analysis,the hexagonal composite grid antireflection micro-nanostructure was successfully fabricated by a combination of photolithography and etching technology.Furthermore,its morphology was evaluated using a scanning electron microscope(SEM),while a spectrometer measured its optical reflectivity.Lastly,an adhesive tape test was used to examine the sample surface and discuss the protective capacity of the composite grid for the antireflection micronanostructure.Results and Discussions The optical reflectivity test shows an average reflectivity difference of 0.068%bet

关 键 词：减反射微纳结构 复合网栅结构 光学性能 力学保护 

分 类 号：O485[理学—固体物理]