氮化钼薄膜的制备、性能及其应用研究进展  

Research Progress of the Preparation,Properties and Application of Molybdenum Nitride Films

作　　者：童品森 魏宁 吴宏荣 TONG Pinsen;WEI Ning;WU Hongrong(College of Mechanical Engineering,Jiangnan University,Wuxi 214122,China)

机构地区：[1]江南大学机械工程学院,江苏无锡214122

出　　处：《材料保护》2023年第10期182-193,共12页Materials Protection

基　　金：国家自然科学基金青年基金(12002133);江苏省科技计划项目基金青年基金(BK20200590);江南大学基本科研计划青年基金(JUSRP121040);纳智能材料器件教育部重点实验室开放课题基金项目NJ2022002(INMD-2022M02)资助。

摘　　要：氮化钼作为过渡金属氮化物的典型代表,具有良好的导电性以及优异的力学性能、电化学性能,在催化、储能、集成电路、保护涂层等领域有着广泛的应用前景。然而,目前国内有关氮化钼薄膜的综述较少。首先总结了氮化钼的分子结构及其物理性能和力学性能;其次总结了氮化钼薄膜的主要制备方法,包括溶液法、溅射法、原子层沉积法以及化学气相沉积法等,归纳了各种氮化钼薄膜制备方法的优缺点及其适用的场景;最后,对氮化钼薄膜的潜在应用前景进行了总结和展望。As a typical representative of transition metal nitride,molybdenum nitride exhibits notable electrical conductivity,excellent mechanical properties,and electrochemistry performance,making it promising in a wide range of applications such as catalysis,energy storage,integrated circuits,and protective coatings.However,there are few molybdenum nitride film-related review articles in Chinese.In this paper,the molecular structure,physical and mechanical properties of molybdenum nitride were first summarized,and then the main preparation methods of molybdenum nitride film were summarized,including solution method,sputtering method,atomic layer deposition method,and chemical vapor deposition method.Meanwhile,the advantages and disadvantages of these methods and their applicable scenarios were summarized.Finally,the potential application prospects of molybdenum nitride film were summarized and prospected.

关 键 词：氮化钼薄膜 物理性能 力学性能 制备方法 应用 

分 类 号：TG174.44[金属学及工艺—金属表面处理]