CASINO模拟用于扫描电镜能谱法测定铜镀金纳米薄膜厚度  

Determination of thickness of gold nano-film based copper by scanning electron microscope energy disperse spectroscopy with CASINO simulation

作　　者：王丁丁[1] 马贤 刘庆凯[1] 刘涛[1,2] WANG Dingding;MA Xian;LIU Qingkai;LIU Tao(Institute of Physical and Chemical Engineering of Nuclear Industry,Tianjin 300180,China;Science and Technology on Particle Transport and Separa-Tion Laboratory,Tianjin 300180,China)

机构地区：[1]核工业理化工程研究院,天津300180 [2]粒子输运与富集技术国防科技重点实验室,天津300180

出　　处：《冶金分析》2023年第9期49-55,共7页Metallurgical Analysis

摘　　要：以铜镀金纳米薄膜为研究对象,利用CASINO软件模拟计算电子束与材料的相互作用,得到不同铜镀金纳米薄膜厚度(10~1000nm)、不同加速电压(15、20kV)下样品的X射线分布及X射线出射强度,建立不同加速电压下膜厚与金薄膜信号强度和纯金信号强度比值(KAu)的关系曲线。利用扫描电镜能谱仪(SED-EDS),对4种厚度样品进行能谱测量,得到KAu值,通过关系曲线计算得到膜厚值,以俄歇电子能谱仪测量结果作为参考值,用于判断此方法的测量误差。结果表明:15kV加速电压下,膜厚测量范围为10~200nm;20kV加速电压下,膜厚测量范围为10~300nm;不同加速电压的膜厚曲线趋势相同,对于30~50nm左右铜镀金薄膜,20kV条件下的结果准确度更好,测量相对误差均小于10%,满足日常纳米膜厚的测试需求。With Au nano-film based Cu as study object,the interaction between electron beam and material was simulated and calculated with CASINO software.The X-ray distribution and X-ray emission intensity of the samples with different nano-film thickness(10-1000nm)and different acceleration voltages(15and 20kV)were obtained.Under different acceleration voltages,the relationship curves of the thickness with KAu,that was the signal intensity ratio of Au film to pure Au,were established.Four samples with different thickness were determined by scanning electron microscope-energy dispersive spectrometer(SEMEDS)to obtain the values of KAu.Then the film thicknesses of samples were calculated by the relationship curve.The determination results of Auger electron spectrometer(AES)were used as the reference values to judge the measurement error of this method.The results showed that the determination range of film thickness was 10-200nm at acceleration voltage of 15kV,and 10-300nm at 20kV.The tendencies of thickness curve at different acceleration voltages were the same.For the Au nano-film based Cu with thickness of 30-50nm,the results was more accurate at 20kV,and the measurement relative errors were all less than 10%,which could meet the measurement requirements of nano-film thickness in routine inspection.

关 键 词：CASINO模拟 扫描电镜能谱仪(SEM-EDS) 铜镀金 金纳米薄膜 厚度 

分 类 号：O657.62[理学—分析化学] TG115.2[理学—化学]