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作 者:朱晓艳 翁钱春[1] ZHU Xiao-Yan;WENG Qian-Chun(State Key Laboratory of Infrared Science and Technology,Shanghai Institute of Technical Physics,the Chinese Academy of Sciences,Shanghai 200083,China)
机构地区:[1]中国科学院上海技术物理研究所红外科学与技术全国重点实验室,上海200083
出 处:《红外与毫米波学报》2023年第5期569-573,共5页Journal of Infrared and Millimeter Waves
基 金:国家自然科学基金优秀青年基金。
摘 要:红外热成像技术通过探测物体自身所发出来的远场红外辐射从而感知表面温度,在军事、民航、安防监控及工业制造等重要领域有着广泛应用。但由于光学衍射极限的限制,红外热成像的分辨率通常在微米尺度及以上,因此无法用于观测纳米尺度的物体。近几年,我们开发了红外被动近场显微成像技术,通过探测物体表面的近场辐射从而极大地突破红外衍射极限限制,将红外温度探测及成像从传统的微米尺度拓展到了纳米尺度。本文将介绍红外被动近场显微成像技术的基本原理,以及基于此可实现的物体表面近场辐射探测与红外超分辨温度成像研究。Infrared thermal imaging,which measures the surface temperature by detecting infrared radiation(IR)spontaneously emitted by the object itself,is widely used in important fields such as military,civil aviation,security monitoring,and industrial manufacturing.However,due to the diffraction limit,the spatial resolution of IR thermal imaging is usually above the micron scale and cannot be used to image nanoscale objects.In recent years,we have developed a passive-type infrared near-field(NF)microscopy.It detects the NF radiation exists on the sample surface and therefore achieves high spatial resolution well-below the diffraction limit.In this paper,we introduce the construction and detailed mechanism of this novel microscope and recently achieved research progress,i.e.,sensitive detection of NF radiation and super-high resolution infrared temperature mapping of working devices.
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