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作 者:李超[1] 杨赟金[1] 刘英波[1] 闫豫昕[1] 刘维理[1] LI Chao;YANG Yun-jin;LIU Ying-bo;YAN Yu-xin;LIU Wei-li(Kunming Metallurgical Research Institute Co.,Ltd.,Kunming,Yunnan 650031,China)
出 处:《云南冶金》2023年第S01期243-247,共5页Yunnan Metallurgy
摘 要:样品采用硝酸-盐酸溶解,用原子荧光光谱法测定了氧化铟中微量砷。方法研究了原子荧光光谱仪工作参数的选择,溶液残留硝酸的影响,还原剂浓度的影响以及铟基体对砷测定的影响等条件试验,最后采用基体匹配法进行测定。在选定的试验条件下,样品加标回收率在95.6%~105.5%之间,相对标准偏差(RSD)为3.29%~5.14%(n=11)。结果表明:方法具有灵敏度高、精密度高、线性关系好、分析结果准确可靠等优点,可测定氧化铟中0.000 50%~0.004 0%范围内的砷,能用于氧化铟中微量砷的测定。Samples were dissolved by nitric acid-hydrochloric acid,and trace arsenic in indium oxide was measured by atomic fluorescence spectrometry.It is studied selection of working parameters of atomic fluorescence spectroscopy,effect on solution residual nitric acid,effect on reducing agent concentration,as well as the effect of indium matrix on arsenic determination,matrix matching method was used for determination.Under the selected experimental conditions,addition standard recovery rate is among 95.6%~105.5%,the relative standard deviation(RSD)is 3.29%~5.14%(n=11).Results show:the method has the advantages that high sensitivity,high precision,good linear relationship,accurate analysis results and the other reliable advantages,it can be used for determination of arsenic with the range of 0.00050%~0.0040%in indium oxide,it also can be used for determination of trace arsenic in indium oxide.
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