太赫兹功能器件表面增透膜研究进展  

Research Progress of Antireflection Coating for Terahertz Functional Devices

作　　者：史佳琦 曹俊诚[1] Shi Jiaqi;Cao Juncheng(Key Laboratory of Terahertz Solid State Technology,Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences,Shanghai 200050,China)

机构地区：[1]中国科学院上海微系统与信息技术研究所太赫兹固态技术重点实验室,上海200050

出　　处：《激光与光电子学进展》2023年第18期111-117,共7页Laser & Optoelectronics Progress

基　　金：国家自然科学基金(61927813)。

摘　　要：工作于太赫兹波段的功能器件常以硅、锗等高折射率材料为界面,这会导致界面与空气的阻抗失配,从而引起不必要的光能损失.在界面镀制增透膜可以有效减小反射率、增加透射率,从而大大提高器件性能,因此增透膜的研制具有重要意义.基于上述的应用需求,首先介绍太赫兹增透膜的研究意义,然后着重介绍目前国内外制备太赫兹增透膜的几种常见方法,并分析各自的优缺点,最后对太赫兹增透膜的研究进行总结和展望.Functional devices operating in the terahertz band often use high refractive index materials such as silicon and germanium as interfaces,which can cause impedance mismatch between the interface and air,thus leading to unnecessary loss of light energy.Plating an antireflective coating at the interface can effectively reduce reflectivity and increase transmittance,thereby greatly improving the performance of the device.Therefore,the development of antireflective coating is of great significance.Considering the above requirements,the research significance of terahertz antireflective coating is first introduced,and then several common methods for preparing terahertz antireflective coating at home and abroad are presented,and the advantages and disadvantages of each are analyzed.Finally,the research on terahertz antireflective coating is summarized along with future prospects.

关 键 词：太赫兹波段 增透膜 折射率 透过率 

分 类 号：O436[机械工程—光学工程]