Uniform deposition of ultra-thin TiO_(2) film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration  

作　　者：Ming Liu Ying Li Rui Wang Guoqiang Shao Pengpeng Lv Jun Li Qingshan Zhu 

机构地区：[1]State Key Laboratory of Multiphase Complex Systems,Institute of Process Engineering,Chinese Academy of Sciences,Beijing 100190,China [2]School of Chemical&Environmental Engineering,China University of Mining and Technology-Beijing,Beijing 100083,China [3]School of Chemical Engineering,University of Chinese Academy of Sciences,Beijing 100049,China

出　　处：《Chinese Journal of Chemical Engineering》2023年第8期99-107,共9页中国化学工程学报（英文版）

基　　金：the support from National Natural Science Foundation of China (22208355, 22178363 and 21978300);the financial support and mica samples from Changzi Wu and RIKA technology CO., LTD.

摘　　要：The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl_(4) concentration on the initial deposition of TiO_(2) on mica by atmospheric pressure chemical vapor deposition(APCVD) was investigated. The precursor concentration significantly affected the deposition and morphology of TiO_(2) grains assembling the film. The deposition time for fully covering the surface of mica decreased from 120 to 10 s as the TiCl_(4) concentration increased from 0.38%to 2.44%. The grain size increased with the TiCl_(4) concentration. The AFM and TEM analysis demonstrated that the aggregation of TiO_(2) clusters at the initial stage finally result to the agglomeration of fine TiO_(2) grains at high TiCl_(4) concentrations. Following the results, it was suggested that the nucleation density and size was easy to be adjusted when the TiCl_(4) concentration is below 0.90%.

关 键 词：Chemical vapor deposition TiO_(2)thin film Nucleation reaction Precursor concentration Pearlescent pigment 

分 类 号：TQ620.1[化学工程—精细化工] TB383.2[一般工业技术—材料科学与工程]