掺杂剂含量对钽粉性能的影响  

Influence of Dopant Dosage on Properties of Tantalum Powder

作　　者：赵春霞 雒国清 赵勇刚 ZHAO Chunxia;LUO Guoqing;ZHAO Yonggang(Ningxia Orient Tantalum Industry Co.,Ltd.,Shizuishan 753000,Ningxia,China;Ningxia Horizontal Titanium Industry Co.,Ltd.,Shizuishan 753000,Ningxia,China)

机构地区：[1]宁夏东方钽业股份有限公司,宁夏石嘴山753000 [2]宁夏中色金航钛业有限公司,宁夏石嘴山753000

出　　处：《有色金属（冶炼部分）》2023年第11期75-78,共4页Nonferrous Metals（Extractive Metallurgy)

基　　金：宁夏回族自治区重点研发计划项目(2022BDE92020)。

摘　　要：分析了掺杂剂对电容器级钽粉性能的影响,重点分析了不同掺杂剂含量下钽粉的物理性能、化学成分及电性能的变化。研究表明,在相同的工艺条件下,随着掺杂剂含量的增加,钽粉的氧含量有增加趋势,钽粉的松装密度、费氏粒径呈降低趋势,-0.043 mm细粉含量有所增加,漏电流、容量呈上升趋势,收缩率、击穿电压呈下降趋势。The influence of dopant dosage on properties of capacitor grade tantalum powder was analyzed.The physical properties,chemical components and electrical properties of tantalum powder with different dopant dosage were analyzed.The results show that under the same process conditions,with the increase of dopant content,the oxygen content of tantalum powder rises,the apparent density and Feuerbach′s particle size of tantalum powder drop,the content of-0.043 mm fine powder increases,and the leakage current,capacity have an increasing trend,and the shrinkage rate and breakdown voltage tend to decrease.

关 键 词：钽粉 掺杂剂 物理性能 化学成分 电性能 

分 类 号：TF841.6[冶金工程—有色金属冶金]