靶电流对高功率脉冲磁控溅射WS_(2)-Ti固体润滑涂层微观组织及力学性能的影响研究  

Influence of Target Current on Microstructure and Mechanical Properties of WS_(2)-Ti Solid Lubricating Coating by High-power Impulse Magnetron Sputtering

作　　者：孙含影 殷俊 张平[2,3] 应普友 吴建波[2,3] 黄敏 林长红 杨涛 Vladimir Levchenko Sun Hanying;Yin Jun;Zhang Ping;Ying Puyou;Wu Jianbo;Huang Min;Lin Changhong;Yang Tao;Vladimir Levchenko

机构地区：[1]浙江科技学院生物与化学工程学院,杭州市310023 [2]台州学院浙江省工量刃具检测与深加工技术研究重点实验室 [3]台州学院材料科学与工程学院,浙江省台州市318000

出　　处：《工具技术》2023年第10期44-48,共5页Tool Engineering

基　　金：浙江省自然科学基金重点项目(LTZ20E020001);台州市科技计划项目(22gya09)

摘　　要：过渡金属硫化物涂层的耐磨性能与其微观结构、力学性能有关,而其结构与溅射能量有关。高能脉冲磁控溅射(HiPIMS)具有离化率高和沉积能量高的特性,其沉积能量受控于靶电流。采用HiPIMS技术,通过改变Ti靶电流制备了WS_(2)-Ti涂层,并利用扫描电镜、能谱仪、X射线衍射仪和纳米压痕仪表征涂层的微观组织结构和力学性能。分析结果表明,采用HiPIMS制备WS_(2)-Ti涂层可以有效细化晶粒并抑制其柱状生长,所制备的涂层结构致密且以非晶态为主;随着靶电流的增加,可进一步细化WS_(2)-Ti涂层晶粒,提高其致密度;涂层硬度随靶电流的增大呈先上升再下降的趋势,而其约化弹性模量先下降再上升;相应塑性因子H/E_(r)和H_(3)/E_(r)^(2)先变大后变小,在靶电流为50A时达到最高。The wear resistance of transition metal sulfide film is related to its microstructure and mechanical properties,and its structure has relation with sputtering energy.High-power impulse magnetron sputtering(HiPIMS)has the characteristics of high ionization rate and high deposition energy,which can be controlled by the target current.HiPIMS technology is used to prepare WS_(2)-Ti coating under the different Ti target currents.SEM,EDS,XRD and nano-indenter are used to study the microstructure and mechanical properties of the coating.The results show that the grains of the WS_(2)-Ti coating can be refined and the columnar growth can be restrained by using HiPIMS.The prepared coating are mainly amorphous with compact structure.The grains can be further refined and the structure will be more dense with increasing of Ti target current.Meanwhile,the hardness(H)of the film increases first and then decreases.While the reduced elastic modulus(E_(r))decreases first and then increases.The plastic factors of H/E_(r)and H 3/E_(r)^(2)increase first and then decrease,and reaches the highest when the target current is 50A.

关 键 词：高功率脉冲磁控溅射 WS_(2)-Ti涂层 靶电流 微观结构 力学性能 

分 类 号：TG174.4[金属学及工艺—金属表面处理] TH14[金属学及工艺—金属学]