高集成度复杂光刻版版图的快速巡查与修正技术  

Rapid Inspection and Automatic Correction Technique for Highly Integrated Complex Photolithography

作　　者：黄翔宇 纪宝林 马协力 HUANG Xiangyu;JI Baolin;MA Xieli(China State Grid Southern Group Co.,Ltd.,Nanjing 211153,China)

机构地区：[1]中电国基南方集团有限公司,江苏南京211153

出　　处：《电子工业专用设备》2023年第5期29-35,共7页Equipment for Electronic Products Manufacturing

摘　　要：介绍了一种高集成度复杂光刻版版图的快速巡查与自动修正技术。其主要包括线条修复模块、逻辑处理模块和图形巡查模块。通过对L-edit软件嵌入式程序开发,实现版图中关键图形和易错位置的快速巡查与自动修正处理,大幅提高了先进掩模制造加工技术中高集成度复杂光刻版版图的核查准确度与处理效率。A kind of rapid inspection and automatic correction technique is presented in this paper for highly integrated complex photolithography.The technique comprises three modules,such as the line repair module,the logic processing module and the graphic inspection module.By embedding the program developed for L-edit software,the critical graphics and error-prone positions in the pattern can be efficiently inspected and automatically corrected,greatly enhancing the accuracy and efficiency of verifying highly integrated complex photolithography in advanced mask manufacturing technology.

关 键 词：微光刻 光刻版 高集成度 快速巡查 自动修正 

分 类 号：TN305.7[电子电信—物理电子学]