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作 者:严维鹏 李斌康[1] 段宝军[1] 朱子健 李鹏[1] 宋顾周[1] 宋岩[1] YAN Weipeng;LI Binkang;DUAN Baojun;ZHU Zijian;LI Peng;SONG Guzhou;SONG Yan(State Key Laboratory of Intense Pulsed Radiation Simulation and Effect,Northwest Institute of Nuclear Technology,Xi’an 710024,China)
机构地区:[1]强脉冲辐射环境模拟与效应国家重点实验室(西北核技术研究所),西安710024
出 处:《人工晶体学报》2023年第11期1946-1951,共6页Journal of Synthetic Crystals
基 金:国家重点实验室自主基础研究课题(SKLIPR1903)。
摘 要:闪烁体表面状态将影响其荧光出射强度和空间分辨等闪烁性能,进而影响辐射探测系统的测试结果。本文通过理论模拟和实验研究等方式,系统表征了LYSO∶Ce闪烁体被射线激发时在4种表面状态下(双面抛光、仅出射面抛光、仅入射面抛光和双面均不抛光)的荧光强度空间分布,以及闪烁体厚度对其空间分辨的影响规律。结果表明,4种状态在法线方向0°的荧光出射相对强度为0.49∶0.64∶0.89∶1,荧光强度随出射角度增加而逐渐减小。随着表面抛光度的降低,闪烁体出射荧光空间分布更均匀。闪烁体厚度为0.3、1.0和5.0 mm时,双面抛光的空间分辨分别为1.70、1.36和1.12 lp/mm,单面抛光-出射面抛光的空间分辨为1.5、1.2和1.0 lp/mm,空间分辨随闪烁体厚度增加而降低,并且双面抛光时空间分辨比单面抛光提升了约12%。The surface states of scintillator will affect its scintillation performance such as fluorescence emission intensity and spatial resolution,and then affect the test results of radiation detection system.By means of theoretical simulation and experimental research,this paper systematically explored the spatial distribution of fluorescence intensity of LYSO∶Ce scintillator under four surface states(two sides polished,exit side polished only,inlet side polished only and two sides unpolished)when excited by radiation,and the influence of scintillator thickness on its spatial resolution.The results show that the relative fluorescence intensity of the four states at 0°normal direction is 0.49∶0.64∶0.89∶1,and the fluorescence intensity gradually decreases with the emission angle increase.As the surface polished degree decreases,the spatial distribution of fluorescence emitted from scintillators becomes uniformly.When the thicknesses of the scintillator are 0.3,1.0 and 5.0 mm,the spatial resolutions of two sides polished are 1.70,1.36 and 1.12 lp/mm,respectively.The spatial resolutions of exit side polished are 1.5,1.2 and 1.0 lp/mm,respectively.The spatial resolution decreases with the scintillator thickness increases,and the spatial resolution of two sides polished is improved by about 12%compared to exit side polished only.
关 键 词:LYSO∶Ce闪烁体 表面状态 荧光强度 空间分辨 厚度
分 类 号:O734[理学—晶体学] TL812[核科学技术—核技术及应用]
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