光学级多晶金刚石膜的快速生长  

Rapid Growth of Optical Grade Polycrystalline Diamond Films

作　　者：产思义 屠菊萍 黄珂 邵思武 刘鹏 杨志亮 刘金龙 陈良贤 魏俊俊 郑宇亭 李成明 Chan Siyi;Tu Juping;Huang Ke;Shao Siwu;Liu Peng;Yang Zhiliang;Liu Jinglong;Chen Liangxian;Wei Junjun;Zheng Yuting;Li Chengming(Institute for Advanced Materials and Technology,University of Science and Technology Beijing,Beijing 100083,China)

机构地区：[1]北京科技大学新材料技术研究院,北京100083

出　　处：《光学学报》2023年第19期296-304,共9页Acta Optica Sinica

基　　金：国家磁约束核聚变能发展研究专项(2019YFE03100200)。

摘　　要：光学级金刚石膜的快速生长一直是微波化学气相沉积金刚石研究领域的热点和难点之一,通常对于大尺寸金刚石膜的生长速率和光学质量不可兼得。采用正交实验方法,优化光学级金刚石膜的工艺参数,最终在高功率、高甲烷同时辅助氧气刻蚀条件下,实现了光学级金刚石材料的快速生长,其生长速率为3.1μm/h,可见光波段内透过率最高为70.9%,10.6μm处红外透过率达到68.9%。等离子体诊断结果表明,高质量金刚石的快速生长主要由于高功率密度有助于原子H的激发和CH4的分解,加入氧气也有助于CH4的分解,同时对非金刚石相具有刻蚀作用,从而实现了高质量金刚石膜的快速沉积。Objective Diamond features excellent impact resistance,high thermal conductivity,and high transmittance over a wide wavelength range,which makes it an ideal material for infrared optical windows,high-power laser windows,X-ray windows,and microwave windows.Microwave plasma chemical vapor deposition(MPCVD)is the most commonly employed method to prepare optical grade diamond films,but the optical quality and deposition rate are often mutually constraining factors with the increasing deposition size.Currently,high diamond quality and high deposition rate are difficult to be achieved spontaneously.The growth rate of high-quality optical diamond films is typically in the range of 1-2μm/h.Fast growth can be economically valuable for preparing diamond optical windows,significantly saving costs,and improving preparation efficiency.This is particularly important for applications that typically require the utilization of thicknesses in the millimeter range.Methods The substrate adopted in this study is a p-type(100)silicon wafer with a diameter of 35 mm and thickness of 3 mm and is pretreated by grinding with 5μm diamond powder for 15 min to disperse nucleated crystalline species.The wafer is then ultrasonically cleaned in acetone and alcohol for 15 min each before diamond film deposition in a 2.45 GHz and 6 kW MPCVD system.The orthogonal experimental method is leveraged to investigate the effects of substrate temperature,methane volume fraction,and oxygen volume fraction on growth,and the growth parameters are optimized by comparing the full width at half peak of the diamond at different parameters through Raman spectrum analysis.After optimizing the process parameters,the power and cavity pressure are increased,and the methane volume fraction is adjusted to deposit the diamond films.Preliminary observations of the diamond films are conducted by an optical microscope in transillumination mode,and diamond quality is determined through Raman spectrum analysis.X-ray diffractometry is utilized to analyze the crystal structur

关 键 词：光学级金刚石膜 正交实验法 高功率密度 高生长速率 氧气 

分 类 号：O484[理学—固体物理]