Microstructure,Properties,and Grain Growth Kinetics of Mo-5Ta Refractory Sputtering Targets Prepared by SPS  

作　　者：LIU Dawei YANG Xiaolong HUANG Lei PAN Yafei ZHANG Jiuxing 

机构地区：[1]School of Materials Science and Engineering,Hefei University of Technology,Hefei 230009,China [2]Engineering Research Center of High-Performance Copper Alloy Materials and Processing,Ministry of Education,Hefei University of Technology,Hefei 230009,China

出　　处：《Journal of Wuhan University of Technology(Materials Science)》2023年第6期1248-1254,共7页武汉理工大学学报（材料科学英文版）

基　　金：“Solid Waste Recycling”Key Project of National Key R&D Plan of China(No.2018YFC1901700);the Fundamental Research Funds for the Central Universities of China(Nos.JZ2021HGTB0094 and PA2021GDGP0059)。

摘　　要：Mo-5Ta targets were prepared by the spark plasma sintering(SPS)technology under the sintering temperatures of 1400-1600℃,the holding times of 0-20 min,and the axial pressure of 30 MPa.The microstructure,performance,and grain growth kinetics of Mo-5Ta sputtering targets were studied.With the increase of sintering temperatures and times,Ta can more dissolve in Mo and form a Mo(Ta)solid solution.The grain sizes of Mo-5Ta targets remain unchanged at low temperatures(1400-1500℃)while increasing significantly at high temperature(1600℃)with the extension of the holding time.In addition,the densities and Vickers hardness(HV_(0.5))first ascend and then decrease with sintering proceeding.The thermal conductivity is positively correlated with the grain size and density,as a result of their joint action.Based on the comprehensive analysis,the grain growth is dominated by the combination of boundary diffusion and volume diffusion.When n=2,the activation energies of grain growth under holding times of 5,10,20 min are calculated as 762.70,617.86,and 616.52 kJ/mol,respectively.

关 键 词：SPS Mo-5Ta targets structure PROPERTIES grain growth kinetics 

分 类 号：TG146.412[一般工业技术—材料科学与工程]