感应耦合等离子体增强磁控溅射法制备MoO_(3)高透亲水光学薄膜  

Preparation of MoO_(3) high-transmittance hydrophilic opticalfilms by inductively coupled plasma-enhanced magnetron sputtering

作　　者：彭井泉 郑学军[1] 冯春阳 李方 黄乐 陈立[1,3] 左滨槐 陈丽娟 贺楚才 PENG Jingquan;ZHENG Xuejun;FENG Chunyang;LI Fang;HUANG Le;CHEN Li;ZUO Binhuai;CHEN Lijuan;HE Chucai(School of Mechanical Engineering and Mechanics,Xiangtan University,Xiangtan 411105,China;Micro-Electronics Research Institute,Hangzhou Dianzi University,Hangzhou 310061,China;Xiangtan Hongda Vacuum Technology Co.,Ltd.,Xiangtan 411104,China)

机构地区：[1]湘潭大学机械工程与力学学院,湖南湘潭411105 [2]杭州电子科技大学微电子研究中心,杭州310018 [3]宏大真空技术股份有限公司,湖南湘潭411104

出　　处：《功能材料》2023年第11期11118-11125,共8页Journal of Functional Materials

基　　金：国家自然科学基金(11832016);国家重点研发计划(2021YFB4000802);湖南创新型省份建设专项(2020GK2014);合肥通用机械研究院有限公司项目(2021ZKKF 043);湖南省研究生科研创新项目(CX20210644)。

摘　　要：将磁控溅射和感应耦合相结合形成感应耦合等离子体增强磁控溅射技术(ICPMS),制备了MoO_(3)高透亲水光学薄膜。使用分光光度计、水接触角测试仪、扫描电子显微镜、X射线衍射仪和X射线能谱仪,分别表征薄膜的光学性能、润湿性能、显微形貌、晶体结构和化学成分。通过正交实验法,以MoO_(3)薄膜的氧钼比、光学透过率、水接触角为指标,探究了感应耦合等离子体(ICP)氧氩比、ICP功率、靶位工作压强和ICP前处理时间工艺参数对MoO_(3)薄膜性能的影响。结果表明:氧氩比是影响性能的主要参数,其次是工作压强,影响最小参数是ICP功率。最优工艺参数是氧氩比400/300、靶位工作压强为0.15 Pa、功率为1500 W、前处理时间为18 min。研究为高透亲水光学薄膜应用,提供具体实验设计和工艺方法指导。The inductively coupled plasma enhanced magnetron sputtering(ICPMS)is proposed by combining the magnetron sputtering and inductive coupling techniques,and it is used to prepare the high transmittance hydrophilic optical film.The optical and wetting properties,microscopic morphology,crystal structure and chemical composition were characterized by ultraviolet-infrared-visible spectrophotometer,water contact angle tester,scanning electron microscopy,X-ray diffractometry and X-ray energy spectrometry.The O/Mo ratio,optical transmittance and water contact angle of MoO_(3) films were used as the experimental indicators in the orthogonal test,in order to explore the influences of the inductively coupled plasma(ICP)oxygen to argon ratio,ICP power,target working pressure and ICP pre-treatment time on the optical and wetting properties.The results show that the influence degree order of the main parameters from strong to weak is ICP oxygen-to-argon ratio,target operating pressure,pre-treatment time and ICP power,and the optimum process parameters optimized are 400/300,0.15 Pa,1500 W and 18 min,in one-to-one correspondence.The research provides the specific process method and experimental basis for the preparation of high-quality MoO_(3) films and the potential application in the high transmittance hydrophilic optical film.

关 键 词：正交实验 感应耦合等离子体增强磁控溅射法 MoO_(3)薄膜 透过率 接触角 

分 类 号：TB43[一般工业技术]