UV光固化涂料游离单体和光引发剂残余问题研究  

Research on Residual Monomer and Photoinitiator in UV Curable Coatings

作　　者：段晓俊 罗建华 李彩霞 梁文康 朱延安 Duan Xiaojun;Luo Jianhua;Li Caixia;Liang Wenkang;Zhu Yanan(Guangdong Provincial Key Laboratory of Environmentally Friendly Coatings,Carpoly Chemical Group Co.,Ltd.,Jiangmen,Guangdong 529085,China)

机构地区：[1]广东省环境友好涂料企业重点实验室,嘉宝莉化工集团股份有限公司,广东江门529085

出　　处：《涂层与防护》2023年第11期11-15,共5页Coating and Protection

基　　金：国家重点研发计划“高端功能与智能材料”重点专项(2022YFB3806404)。

摘　　要：分析了涂层颜色、不同钛白粉添加量、单体种类和添加比例、光引发剂种类和添加比例、涂层厚度、不同基材、多层涂层对涂膜中游离单体和光引发剂残余浓度的影响规律。研究指出,单层涂层随遮盖力提升,游离单体和光引发剂残余浓度随之升高;引发剂添加不足时会造成游离单体残余明显增加,引发剂添加过量则会有光引发剂残余;在一定范围内提高固化能量可使游离单体和光引发剂残余浓度降低;辊涂UV漆时疏松基材比致密基材更容易造成游离单体残余。The effects of different film color,TiO2 dosage,monomer,photoinitiator,film thickness,substrate and coating process on residual concentration of monomers and photoinitiators are investigated,which include.The results show that the residual concentration of free monomer and photoinitiator increases with the increase of coverage degree.The insufficiency of photoinitiator might be resulted in an obvious increase of residual monomer while the overdosage of photoinitiator might cause redisue of photoinitiator.The residual concentration of free monomer and photoinitiator can be reduced by increasing the curing energy within a certain range.The loose substrate is more likely than the dense substrate to cause residual free monomer.

关 键 词：光固化涂料 残余单体 残余引发剂 涂层 

分 类 号：TQ630[化学工程—精细化工]