Nanometer-scale displacement measurement based on an orthogonal dual Michelson interferometer  

作　　者：王菊 蔡滋恒 于晋龙 罗浩 马闯 Ju Wang;Ziheng Cai;Jinlong Yu;Hao Luo;Chuang Ma(School of Electrical and Information Engineering,Tianjin University,Tianjin 300072,China)

机构地区：[1]School of Electrical and Information Engineering,Tianjin University,Tianjin 300072,China

出　　处：《Chinese Optics Letters》2023年第10期30-35,共6页中国光学快报（英文版）

基　　金：supported in part by the National Natural Science Foundation of China(No.62005194).

摘　　要：In this Letter,we propose a simple structure of an orthogonal type double Michelson interferometer.The orthogonal detection method overcomes the problems of uneven ranging sensitivity and the inability of traditional interferometers to determine the displacement direction.The displacement measurement principle and signal processing method of the orthogonal double interferometer are studied.Unlike the arctangent algorithm,the displacement analysis uses the arc cosine algorithm,avoiding any pole limit in the distance analysis process.The minimum step size of the final experimental displacement system is 5 nm,which exhibits good repeatability,and the average error is less than 0.12 nm.

关 键 词：orthogonal detection nanoscale displacement measurement laser interferometer 

分 类 号：O436.1[机械工程—光学工程]