结构紧凑的高均匀性硅波导阵列波导光栅  

Compact High Uniformity Silicon Waveguide Arrayed Waveguide Grating

作　　者：封治华 袁硕[2] 陈益姝 刘海鹏 毕群玉 张福领 冯吉军[2] Feng Zhihua;Yuan Shuo;Chen Yishu;Liu Haipeng;Bi Qunyu;Zhang Fuling;Feng Jijun(School of Physics,Xidian University,Xi an 710071,Shaanxi,China;Shanghai Key Laboratory of Modern Optical System,University of Shanghai for Science and Technology,Shanghai 200093,China;Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province,Soochow University,Suzhou 215006,Jiangsu,China;The 27th Research Institute,China Electronics Technology Group Corporation,Zhengzhou 450047,Henan,China)

机构地区：[1]西安电子科技大学物理学院,陕西西安710071 [2]上海理工大学上海市现代光学系统重点实验室,上海200093 [3]苏州大学江苏省先进光学制造技术重点实验室,江苏苏州215006 [4]中国电子科技集团公司第二十七研究所,河南郑州450047

出　　处：《中国激光》2023年第22期209-214,共6页Chinese Journal of Lasers

基　　金：国家重点研发计划(2022YFE0107400);国家自然科学基金(11774235,61705130,11933005);上海市科学技术委员会(23010503600);上海市高校特聘教授(东方学者)岗位计划(GZ2020015);江苏省先进光学制造技术重点实验室资助项目(KJS2139)。

摘　　要：基于绝缘体上硅材料平台,设计并制作了一种结构紧凑的高均匀性硅波导阵列波导光栅,其拥有8个输出通道并且通道间隔为200 GHz。分析了绝缘体上硅材料平台中硅波导的弯曲半径对弯曲损耗和有效折射率的影响。测试结果表明,该器件的插入损耗为19.6 dB,串扰为-15 dB,非均匀性为0.87 dB,3 dB带宽为1.06 nm,结构尺寸仅为294μm×190μm。芯片的制作工艺与互补金属氧化物半导体工艺兼容,这使得阵列波导光栅的大批量、低成本生产成为可能,对集成波分复用网络的发展具有重要的意义。Objective With the rapid development of large traffic network,the demand for data exchange rates is increasing daily.Wavelengthdivision multiplexing(WDM)has garnered considerable attention in optical communication networks owing to its high communication speed,transparent signal transmission,efficient expansion of transmission capacity,and low cost.Dense wavelength division multiplexing(DWDM)is a crucial component of the optical communication field because it increases the capacity of communication systems and satisfies the public demand for greater communication bandwidth.Arrayed waveguide gratings(AWG)have low crosstalk,low insertion loss,high uniformity,high reliability,and a compact structure.Therefore,they have become the most commonly employed technical solution for DWDM.AWGs have been demonstrated in low-refractive-index-contrast materials,such as InP,silica,and polymers.The refractive-index contrast of the core and cladding of these materials is low;therefore,the device size and bending loss are large,which is unfavorable for the development of highly integrated DWDM systems.Owing to the high refractive-index contrast,a silicon waveguide arrayed waveguide grating can be made extremely compact,allowing for low-cost and high-volume manufacturing owing to its complementary metal-oxide semiconductor(CMOS)-compatible processing.Many arrayed waveguide gratings using silicon waveguides have been proposed.However,they still need to be further reduced in size to increase integration,and the uniformity of each output channel needs to be improved.Methods A compact,highly uniform silicon-arrayed waveguide grating is studied.First,the arrayed waveguide grating is theoretically analyzed to understand its design scheme and performance parameters.Subsequently,the waveguide bending loss and effective index versus the silicon waveguide bending radius are simulated(Fig.3).With a gradual decrease in the bending radius,the bending loss and effective index first decrease and then stabilize.When the bending radius is between 2.

关 键 词：集成光学 阵列波导光栅 结构紧凑 硅基波导 波分复用 

分 类 号：O436[机械工程—光学工程]