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作 者:Qi Yuan Zhuozhi Zhang Meng Wang Kin Fai Ho Tao Wang Shuncheng Lee
机构地区:[1]Department of Civil and Environmental Engineering,The Hong Kong Polytechnic University,Kowloon,Hong Kong,China [2]School of Public Health and Primary Care,The Chinese University of Hong Kong,Shatin,Hong Kong,China
出 处:《Journal of Environmental Sciences》2024年第2期570-582,共13页环境科学学报(英文版)
基 金:financially supported by the Research Grants Council (RGC)of Hong Kong Special Administrative Region,China (No.T24-504/17-N)。
摘 要:Smog chambers provide a potent approach to explore the secondary organic aerosol formation under varied conditions.This study describes the construction and characterization of a new smog chamber facility for studying the formation mechanisms of gas-phase products and secondary organic aerosol from the photooxidation of volatile organic compounds.The chamber is a 5.4 m^(3) Fluorinated Ethylene Propylene(FEP)Teflon reactor with the potential to perform photooxidation experiments at controlled temperature and relative humidity.Detailed characterizations were conducted for evaluation of stability of environmental parameters,mixing time,background contamination,light intensity,and wall losses of gases and particles.The photolysis rate of NO_(2)(J_(NO2))ranged from(1.02-3.32)×10^(-3)sec^(-1),comparable to the average J_(NO2)in ambient environment.The wall loss rates for NO,NO_(2),and O_(3)were 0.47×10^(-4),0.37×10^(-4),and 1.17×10^(-4)min^(-1),while wall loss of toluene was obsoletely found in a 6 hr test.The particle number wall loss rates are(0.01-2.46)×10^(-3)min^(-1)for 40-350 nm with an average lifetime of more than one day.A series of toluene photooxidation experiments were carried out in absence of NO_xunder dry conditions.The results of the simulation experiments demonstrated that the chamber is well designed to simulate photolysis progress in the atmosphere.
关 键 词:Smog chamber Gas-phase oxidation Chamber characterization Chemical mechanism
分 类 号:X513[环境科学与工程—环境工程]
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