典型低轨辐照环境对MoS_(2)-Ti薄膜真空摩擦学性能的影响  

Influence of the Typical Low-orbital Irradiation Environment on the Tribological Performance of MoS_(2)-Ti Film in Vacuum

作　　者：胡汉军[1] 贺颖 张凯锋[1] 周晖[1] HU Hanjun;HE Ying;ZHANG Kaifeng;ZHOU Hui(Science and Technology on Vacuum Technology and Physics Laboratory,Lanzhou Institute of Physics,Lanzhou 730000,China)

机构地区：[1]兰州空间技术物理研究所真空技术与物理重点实验室,兰州730000

出　　处：《真空与低温》2024年第1期39-47,共9页Vacuum and Cryogenics

摘　　要：采用非平衡磁控溅射方法在9Cr18基底上制备了MoS_(2)-Ti薄膜,并对4组样品分别进行了电子辐照、电子/质子辐照、电子/质子/紫外辐照、电子/质子/紫外/原子氧辐照。采用SEM、XRD、XPS分析了辐照前后薄膜的结构和化学组成变化,通过摩擦试验考察了辐照前后薄膜的摩擦学性能,探讨了其损伤机制。研究结果表明,电子辐照、质子辐照、紫外辐照对MoS_(2)-Ti薄膜的显微组织结构、表面形貌及摩擦学性能没有明显影响。动能5 eV的原子氧对MoS_(2)-Ti薄膜表面有显著的损伤,主要表现在表面出现“绒毯”状形态,Mo、S和Ti元素被氧化成高价氧化物。原子氧辐照导致MoS_(2)-Ti薄膜摩擦起始和中段摩擦因数升高、中段摩擦因数不稳定,比磨损率增大。The specimens of MoS_(2)-Ti film on substrate of 9Cr18 were prepared by the method of unbalanced magnetron sputtering,and then different kinds of irradiation experiments were conducted for five group specimens,which of them were no irradiation,electron,electron/proton,electron/proton/ultraviolet,electron/proton/ultraviolet/atomic oxygen.Through the characterizations of SEM,XRD,XPS profile analysis and friction tests,the influence of each irradiation on the film's microstructure,chemical components and tribological performance in vacuum was studied comprehensively.The results revealed there were not great effects on the microstructure,surface morphology and tribological performance,caused by the irradiation of electron,proton,ultraviolet.The atomic oxygen with an energy of 5 eV showed strong damage effects on the film,leading to the‘blanket-like’surface morphology,the oxidation of Mo,S,Ti,which resulted in the increase of friction coefficient at initial and middle stages,fluctuation at middle states,as well as the increase of specific wear rate.

关 键 词：MoS_(2)-Ti 摩擦学 原子氧 辐照 

分 类 号：TG115.5.8[金属学及工艺—物理冶金] O484[金属学及工艺—金属学]