检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:孙文君 吕璐成 张凯 刘婷 韩涛[1,2] 赵亚娟 SUN Wenjun;LV Lucheng;ZHANG Kai;LIU Ting;HAN Tao;ZHAO Yajuan(National Science Library,Chinese Academy of Sciences,Beijing 100190,China;Department of Information Resources Management,School of Economics and Management,University of Chinese Academy of Sciences,Beijing 100190,China)
机构地区:[1]中国科学院文献情报中心,北京100190 [2]中国科学院大学经济与管理学院信息资源管理系,北京100190
出 处:《世界科技研究与发展》2023年第6期746-760,共15页World Sci-Tech R&D
基 金:国家科技图书文献中心(NSTL)资助项目“支撑重点产业发展的关键核心技术链识别与储备研究”(E11Z1801)。
摘 要:为助力我国集成电路材料产业的科技决策,对集成电路材料产业链各环节进行中美日技术布局差异分析与揭示。基于论文、专利数据,采用文献计量分析方法开展技术布局差异分析研究。具体地,通过梳理集成电路材料产业链,明确产业链各环节的7种材料,分别从Web of Science和IncoPat数据库获取全球论文和专利数据,结合论文质量和专利价值判断标准,分析中美日三国的论文发表与专利申请趋势差异、机构数量差异、企业数量差异和技术差异。研究发现,近年来我国在集成电路材料产业链上的专利和论文情况均取得进步,高价值专利和高被引论文占比持续攀升;但在不同材料上的表现不均衡,在硅晶圆、光刻胶等领域更注重专利申请,而在电子气体、湿电子化学品等领域更注重论文发表;在专利申请机构总量上略有优势,但申请高价值专利的机构不足,呈现出论文数量多、机构少的特点;专利申请的机构中,企业占比较多,且高价值专利主要集中在企业。中美日三国的技术关注点存在差异,美日有部分共同关注点。Based on the industrial chain of integrated circuit materials,this paper analyzes and reveals the differences in the technological layout between China,the United States,and Japan in all links of the industrial chain to help the scientific and technological decision-making of China’s integrated circuit materials industry.Based on the data of papers and patents,this study adopts the bibliometric analysis method to carry out the analysis and research of technical layout differences.Specifically,by combing the industrial chain of integrated circuit materials,seven kinds of materials in each link of the industrial chain are defined,and the global papers and patent data of each material are obtained from the Web of Science and Incopat patent databases.Combined with the paper quality and patent value judgment standards,the application and publication trend difference analysis,organization number difference analysis,enterprise number difference analysis and technology difference analysis of China,the United States and Japan are carried out.In recent years,China has made progress in patents and papers in the integrated circuit materials industry chain.The proportion of high-value patents and highly cited papers continues to rise,but the performance of different materials in the industry chain could be better.China pays more attention to patent applications in the fields of silicon wafers and photoresists and pays more attention to paper publications in the fields of electronic gases and wet electronic chemicals.China has a slight advantage in the total number of patent application institutions,but there needs to be more institutions applying for high-value patents.It shows the characteristics of more papers and fewer institutions.Enterprises account for a large proportion of patent application institutions,and high-value patents are mainly concentrated in enterprises.There are differences in technical concerns between China,the United States and Japan,and the United States and Japan have some common concerns.
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:13.59.56.153