声子极化激元干涉条纹周期的精密测量研究  

Research on precise measurement of phonon-polariton interference fringe period

作　　者：尹志珺 王振兴[1,2,3,4,5] 李荃 宋仁康[1,2,3,4,5] 邓晓 雷李华 Yin Zhijun;Wang Zhenxing;Li Quan;Song Renkang;Deng Xiao;Lei Lihua(School of Physics Science and Engineering,Tongji University,Shanghai 200092,China;Institute of Precision Optical Engineering,Tongji University,Shanghai 200092,China;MOE Key Laboratory of Advanced Micro-Structured Materials,Shanghai 200092,China;Shanghai Frontiers Science Center of Digital Optics,Shanghai 200092,China;Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications,Shanghai 200092,China;Shanghai Institute of Measurement and Testing Technology,Shanghai 201203,China)

机构地区：[1]同济大学物理科学与工程学院,上海200092 [2]同济大学精密光学工程技术研究所,上海200092 [3]先进微结构材料教育部重点实验室,上海200092 [4]上海市数字光学前沿科学研究基地,上海200092 [5]上海市全光谱高性能光学薄膜器件及应用专业技术服务平台,上海200092 [6]上海市计量测试技术研究院,上海201203

出　　处：《红外与激光工程》2023年第12期14-22,共9页Infrared and Laser Engineering

基　　金：国家自然科学基金面上项目(62075165,62175188);国家重点研发计划项目(2022YFF0605502);上海张江国家自主创新示范区专项发展资金重点项目(ZJ2021-ZD-008);上海市自然科学基金面上项目(23ZR1465800)。

摘　　要：二维材料由于其独特的物理化学性质,对纳米光子学及光电子学的应用与发展具有重要研究价值。特别是二维材料中声子与光子耦合激发产生的声子极化激元高度局域在纳米尺度,在片上光子学的光学操控和能量传输等前沿研究领域具有极大的应用潜力。同时,光电器件制造进入纳米节点,器件应用对材料表征精度具有纳米级的要求。然而目前对声子极化激元特性分析的关键之一在于测量其干涉条纹周期,测量结果准确性依赖于仪器设备校准。因此,为实现对声子极化激元干涉条纹的精确测量,文中提出构建铬原子自溯源型光栅与二维材料的复合结构,分析金属光栅结构周期性变化对二维材料的声子极化激元耦合增强与调制作用,以及基于该原理实现对声子极化激元干涉条纹周期的精密测量。研究实现了测量干涉条纹周期为(261.01±0.34)nm的亚纳米级高精度测量,相比具有不确定度为4 nm的传统拟合测量方式具有可溯源的计量精度,同时实现了对测量仪器的亚纳米级精密校准。自溯源光栅天然溯源至基本自然常数的特性使得测量结果具备极好的准确性和可靠性,为二维材料在微纳光子学器件领域的应用提供了保障。Objective Two-dimensional materials have garnered widespread attention due to their unique photoelectric properties at the nanoscale,showcasing distinctive application advantages in the fields of nano-electronic devices,optics,and energy.Notably,the phonon polaritons generated by the coupled excitation of phonons and photons in two-dimensional materials exhibit highly localized at the nanometer scale,presenting substantial application potential in cutting-edge research fields such as optical manipulation and energy transmission of on-chip photonics.Infrared imaging of the sample revealed that at the sample's edge,the mutual interference of phonon polaritons resulted in the fomation of polarization standing wave fringes parallel to the edge.The fringe period effectively reflects the coupling characteristics of phonon polaritons.Therefore,the study of modulated phonon polariton coupling primarily relies on the precise measurement of the interference fringe period.The current measurement method depends on the linear fitting calculation of image analysis software,and its accuracy is constrained by the image resolution.Additionally,the displacement errors occur in the sample loading stage of SNOM.To enhance measurement accuracy and minimize the impact of the these errors on the measured value,this paper proposes the use a self-traceable chromium grating for the precise measurement of the period of the polariton interference fringe in hBN.Methods In this paper,we present a self-traceable grating-hBN composite structure.The construction involves depositing a chromium grating on the silicon substrate using atomic lithography.The gaps between adjacent grating structures consist of air,and the two-dimensional polar material hBN is placed on the chromium grating.The dispersion of phonon polaritons generated by the recombination of hBN and different media is analyzed using Fabry-Perot quantization conditions.The study further investigates the phonon polariton coupling enhancement and modulation characteristics of two-dimensi

关 键 词：自溯源光栅 二维材料 声子极化激元 纳米计量 

分 类 号：O4-34[理学—物理]