2英寸MPCVD光学级均匀金刚石膜的制备研究  

Uniform Growth of Two-inch MPCVD Optical Grade Diamond Film

作　　者：产思义 屠菊萍 黄珂 邵思武 杨志亮 刘鹏 刘金龙 陈良贤 魏俊俊 安康[3] 郑宇亭 李成明 CHAN Siyi;TU Juping;HUANG Ke;SHAO Siwu;YANG Zhiliang;LIU Peng;LIU Jinlong;CHEN Liangxian;WEI Junjun;AN Kang;ZHENG Yuting;LI Chengming(Institute for Advanced Materials and Technology,University of Science and Technology Beijing,Beijing 100083,China;Shunde Innovation School,University of Science and Technology Beijing,Foshan 528399,China;School of Mechanical and Materials Engineering,North China University of Technology,Beijing 100144,China)

机构地区：[1]北京科技大学新材料技术研究院,北京100083 [2]北京科技大学顺德创新学院,佛山528399 [3]北方工业大学机械与材料工程学院,北京100144

出　　处：《无机材料学报》2023年第12期1413-1419,共7页Journal of Inorganic Materials

基　　金：国家磁约束核聚变发展研究专项基金(2019YFE03100200)。

摘　　要：均匀生长大尺寸光学级金刚石膜一直是微波化学气相沉积(Microwave plasma chemical vapor deposition,MPCVD)金刚石研究领域的热点和难点,沉积台的结构与位置对于金刚石膜均匀性以及厚膜生长的长期稳定性至关重要。本研究通过COMSOL模拟结合实验研究了沉积台高度对衬底表面电场均匀性、等离子体状态和温度均匀性的影响规律,优化了光学级金刚石膜均匀生长的工艺参数,在最佳沉积台高度(2 mm)下沉积得到的2英寸金刚石膜(最大厚度337μm),厚度不均匀性<11%,从膜中心到边缘的拉曼半峰全宽为3~4 cm^(-1),可见光波段内最高透过率为69%~70%,10.6μm处红外透过率为70%。结果表明:金刚石膜的厚度和品质较为均匀,实现了两英寸光学级金刚石膜的均匀沉积。沉积台高度对衬底表面的电场分布、等离子体形状和温度分布都有一定影响,随着沉积台高度增加,衬底表面电场分布均匀性和温度均匀性得到明显改善,且衬底表面的等离子体分布更均匀,H原子和含碳基团的浓度增加。The uniform growth of large-size optical grade diamond films has been one of the hot spots and difficulties in the field of microwave plasma chemical vapor deposition(MPCVD)diamond research,in which the structure and position of the deposition platform are crucial to the uniformity of diamond films and the long-term stability of thick film growth.Here,the effect of deposition platform height on the electric field uniformity,plasma state and temperature uniformity on the substrate surface was investigated by COMSOL simulation combined with experiments to optimize the process parameters for the uniform growth of optical grade diamond films.The 2-inch diamond film with thickness of 337μm and inhomogeneity<11%was obtained at the optimal deposition platform height of 2 mm.The full width of the Raman half-peak from the center to the edge of the film is in the range of 3–4 cm^(-1),and the maximum transmittance is 69%–70%in the visible light band and 70%in the infrared light at 10.6μm.This indicates that thickness and quality of the diamond film are relatively uniform,thus the uniform deposition of 2-inch optical grade diamond film is achieved.Above results show that the deposition platform height has a great influence on the electric field distribution and plasma state on the substrate surface,and the electric field uniformity on the substrate surface is significantly improved with the increase of the deposition height,but the influence on the temperature uniformity is smaller.

关 键 词：光学级金刚石膜 温度均匀性 红外透过率 沉积台高度 COMSOL模拟 

分 类 号：O484[理学—固体物理]