条形离子源栅网设计及优化  

Design and Optimization of Strip Ion Source Grid

作　　者：龚俊 袁祖浩 佘鹏程 何秋福 李勇 孔令通 Gong Jun;Yuan Zuhao;She Pengcheng;He Qiufu;Li Yong;Kong Lingtong(The 48^(th)Research Institute,CETC,Changsha 410111,China)

机构地区：[1]中国电子科技集团公司第四十八研究所,长沙410111

出　　处：《半导体技术》2024年第2期196-200,共5页Semiconductor Technology

摘　　要：为克服传统圆形离子源刻蚀基片数量较少、产能较低的劣势,提高离子源栅网的精度、稳定性及使用寿命,设计出一种用于离子束刻蚀的条形离子源栅网。采用ANSYS18.2对栅网进行热应力仿真模拟分析,为进一步增强离子源栅网性能,通过加工前后的真空退火处理,达到改善栅网使用性能、提高稳定性和延长使用寿命的效果。将两种栅网装载至M431-9/UM型离子束刻蚀设备进行实验验证,结果表明相比条形腰孔曲面型栅网,条形圆孔平面型栅网在热应力下形变量更小,更符合离子源对精度、稳定性及使用寿命的要求。In order to overcome the disadvantages of the traditional circular ion source with a small number of etching substrates and low production capacity,and improve the accuracy,stability and service life of the ion source grid,a strip ion source grid for ion beam etching was designed.ANSYS182 was used to simulate the thermal stress of the grid,and in order to further enhance the per-formance of the ion source grid,through vacuum annealing treatment before and after processing,the performance,stability and service life of the grid were improved.Two kinds of grids were loaded into the M431-9/UM ion beam etching equipment for test verification.The results show that the deformation of the bar planar grid with cylindrical holes is smaller than that of the bar cambered grid with waist-type holes under thermal stress,and it is more in line with the requirements of accuracy,stability and service life of ion sources.

关 键 词：离子源栅网 退火 形变 均匀性 稳定性 

分 类 号：TN305.7[电子电信—物理电子学]