大面积矩形感性耦合等离子体源的三维流体力学模拟  

THREE-DIMENSIONAL FLUID SIMULATION OF LARGE-AREA RECTANGULAR INDUCTIVELY COUPLED PLASMA SOURCES

作　　者：赵明亮 张钰如 高飞 宋远红 王友年 Zhao Mingliang;Zhang Yuru;Gao Fei;Song Yuanhong;Wang Younian(Key Laboratory of Materials Modification by Laser,Ion,and Electron Beams(Ministry of Education),School of Physics,Dalian University of Technology,Dalian 116024,Liaoning,China)

机构地区：[1]大连理工大学物理学院,三束材料改性教育部重点实验室,辽宁大连116024

出　　处：《力学学报》2023年第12期2891-2899,共9页Chinese Journal of Theoretical and Applied Mechanics

基　　金：国家自然科学基金资助项目(11935005).

摘　　要：利用自主开发的三维流体力学模型程序,对面向平板显示工艺和光伏工艺的大面积矩形感性耦合氩等离子体源进行了数值模拟.该模型自洽地求解了带电粒子以及中性粒子的流体方程和感应电场的波动方程.利用此模型,研究了气压、功率以及线圈形状对各种等离子体参数的三维空间分布和均匀性的影响.研究结果表明,当放电气压较低时(4 mTorr),电子密度的空间分布比较均匀,且电子密度的最大值出现在腔室的中心区域.感性沉积功率密度、激发态氩原子密度以及电子温度的最大值出现在线圈的下方.随着放电功率的增加,即从1000 W增加到4000 W,电子密度显著提高,但电子密度的空间分布变化不大.随着放电气压的升高,电子密度的均匀性明显下降,即电子密度的最大值主要局域在线圈下方.这是因为在较高的气压下,带电粒子与背景气体的碰撞增加,因此使得带电粒子的密度分布变得局域.此外,文章还研究了不同的线圈结构对于等离子体均匀性的影响.结果表明当气压较高(20 mTorr)时,使用3×3阵列线圈产生的等离子体的均匀性优于盘香型线圈,即通过改变线圈结构可以实现对等离子体均匀性的调控.文章的研究成果有助于加深对大面积矩形感性耦合等离子体放电特性的认知,这对于优化平板显示工艺以及光伏工艺至关重要.In this paper,a three-dimensional fluid model has been developed to investigate the properties of large-area rectangular inductively coupled plasma(ICP)sources for flat panel display processes and photovoltaic processes.The model self-consistently solves the fluid equations for charged particles as well as neutral particles and the wave equations for the inductive electric field.Using this model,the effects of gas pressure,discharge power,and coil structure on the three-dimensional spatial distribution and uniformity of various plasma parameters are investigated.The results indicate that when the gas pressure is low(4 mTorr),the electron density is uniformly distributed and is the highest at the center of the chamber.The maxima of the inductive deposition power density,excited state argon atom density,and electron temperature are below the coil.With the increase of the power,i.e.,from 1000 W to 4000 W,the electron density becomes higher and the spatial uniformity is nearly unchanged.However,as the gas pressure increases,the plasma uniformity becomes worse,and the maximum of the electron density appears below the coil.This is due to the fact that at higher gas pressure,the collisions of charged particles with the background gas are enhanced,making the density distribution more localized.Besides,the effect of the coil structure on the plasma uniformity is investigated.At 20 mTorr,the plasma generated by the 3×3 array coil is more uniform than that generated by the rectangular single-planar coil.The results obtained in this work could help us to gain deep insight into the large area rectangular ICPs,which is of significant importance to improve the flat panel display and photovoltaic processes.

关 键 词：大面积矩形感性耦合等离子体源 三维流体力学模拟 平板显示工艺 光伏工艺 

分 类 号：O531[理学—等离子体物理]