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作 者:高晓丹[1] 刘岚[1] 姚敏[1] 魏纯[1] GAO Xiaodan;LIU Lan;YAO Min;WEI Chun(Electronic information Engineering College,Wuhan Donghu University,Wuhan 430212,China)
机构地区:[1]武汉东湖学院电子信息工程学院,湖北武汉430212
出 处:《传感器与微系统》2024年第2期110-112,共3页Transducer and Microsystem Technologies
基 金:湖北省教育厅科学技术研究项目(B2022312)。
摘 要:光纤通信的发展对通信器件中薄膜滤光片提出了新的要求。根据45°倾斜应用的多通道干涉截止滤光片的设计指标,选择Nb2O5和SiO2为高、低折射率材料设计非规整膜系,以减少偏振效应的影响。结合APS1104型镀膜机的特点,分析了设计膜系的膜层灵敏度和薄膜生长过程中的模拟监控曲线,判断设计薄膜的可镀制性。然后采取直接光学监控方式,选择合适的镀制工艺成功镀制滤光片。测试结果表明:滤光片在45°倾斜应用条件下,1255~1365 nm、1475~1502 nm双通带最大插入损耗为0.199 dB,1547~1565 nm为反射带,通带隔离度为17.3 dB,满足系统应用需求。Development of optical fiber communication puts forward new requirements of thin film filters in communication devices.According to the design specifications of multi-channel interference cut-off filter for 45°tilt application,Nb2 O5 and SiO2 are selected as high and low refractive index materials to design irregular,so that it can reduce the influence of polarization effect.Combined with the characteristics of the APS1104 type coating machine,layers sensitivity of the formula and the simulation monitoring curve during thin film growth process are analyzed to judge the producibility of the designed thin-film.Then,the filter is successfully deposited by adopting direct optical monitoring mode and selecting appropriate deposition process.The test results show that under the condition of 45°tilt application,the maximum insertion loss of 1255~1365 nm and 1475~1502 nm double passbands is 0.199 dB,1547~1565 nm is the reflection band,and the passband isolation is 17.3 dB,which meets the application requirements of the system.
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