加速器生产^(103)Pd的厚铑靶制备工艺研究  

Thick Rhodium Plating as the Target for Cyclotron Production of Palladium-103

作　　者：马承伟 段菲 褚浩淼 李光 王晓明 赵紫宇 李超 王成志 温凯 MA Chengwei;DUAN Fei;CHU Haomiao;LI Guang;WANG Xiaoming;ZHAO Ziyu;LI Chao;WANG Chengzhi;WEN Kai(HTA Co.,Ltd.,Beijing 102413,China;CAEA Center of Excellence on Nuclear Technology Applications for Engineering and Industrialization of Radiopharmaceuticals,Beijing 102413,China;CNNC Engineering Research Center of Radiopharmaceuticals,Beijing 102413,China)

机构地区：[1]原子高科股份有限公司,北京102413 [2]国家原子能机构核技术(放射性药物工程转化)研发中心,北京102413 [3]中核集团放射性药物工程技术研究中心,北京102413

出　　处：《同位素》2024年第1期55-63,共9页Journal of Isotopes

基　　金：中核集团“青年英才”项目。

摘　　要：铑靶的制备是加速器生产核素^(103)Pd的关键技术。为制得致密、稳定、厚度高的铑靶,采用改性工艺对硫酸铑溶液进行预处理,并加入一定量电镀添加剂A,得到低应力镀铑液。实验靶片选择金属铜材质,靶片面积约100 mm×10 mm。分别针对电镀过程中的电源电流密度、电镀温度、H_(2)SO_(4)浓度、电镀添加剂A浓度等进行条件实验,获得最佳电镀条件。结果表明,选用最佳电镀条件下,连续四个批次制备的铑镀层质量厚度均大于150 mg/cm^(2),在热冲击实验和坠落实验中,镀层未出现起皮、脱落等问题,镀层致密、平整、与基底结合牢固。在C30回旋加速器内辐照5~51.5 h,可以获得产额5.18~6.04 MBq/(μA·h)、核纯度大于99.9%的^(103)Pd核素。本研究解决了脉冲电镀法制备铑靶工艺稳定性差的问题,制备的厚铑靶可满足^(103)Pd批量化生产要求。The preparation of rhodium target with high quality and thickness is the key to produce ^(103)Pd by cyclotron.In order to improve the thickness and quality of plating,rhodium sulfate solution is pretreated,and a certain amount of electroplating additives A is added.The target plate for ^(103)Pd is made of copper with a target size about 100 mm×10 mm.The optimal electroplating conditions are obtained according to the important conditions in the plating process(e.g.,current density,plating temperature and H_(2)SO_(4) concentration).In four consecutive batches of experiments,the mass thickness of the rhodium plating is higher than 150 mg/cm^(2).In the thermal shock and falling test,the plating layer does not show problems such as flaking,and is tight,smooth and firmly bonded to the substrate.After irradiation in C30 cyclotron for 5-51.5 hours,^(103)Pd nuclide with yield of 5.18-6.04 MBq/(μA·h)and nuclear purity greater than 99.9%can be obtained.The research solve the problem of poor stability of rhodium target preparation process by pulse electroplating,the quality of rhodium target can meet the requirements of ^(103)Pd production.

关 键 词：^(103)Pd 核素制备 回旋加速器 脉冲电镀 近距离治疗 

分 类 号：TL92[核科学技术—核燃料循环与材料]