可见光减反射膜薄层控制误差的分析与性能优化  

Thin-layer control error analysis and performance optimization of visible light anti-reflection film

作　　者：付秀华[1,2] 魏雨君 林兆文 潘永刚[2,3] 李刚 付广元 FU Xiuhua;WEI Yujun;LIN Zhaowen;PAN Yonggang;LI Gang;FU Guangyuan(College of Optoelectronic Engineering,Changchun University of Science and Technology,Changchun 130022,China;Zhongshan Research Institute,Changchun University of Science and Technology,Zhongshan 528436,China;Zhongshan Jilian Optoelectronic Technology Co.,Ltd.,Zhongshan 528436,China;Yunnan North Optical Technology Co.Ltd.,Kunming 650216,China)

机构地区：[1]长春理工大学光电工程学院,吉林长春130022 [2]长春理工大学中山研究院,广东中山528436 [3]中山吉联光电科技有限公司,广东中山528436 [4]云南北方光学科技有限公司,云南昆明650216

出　　处：《光学精密工程》2024年第1期1-11,共11页Optics and Precision Engineering

基　　金：吉林省发改委资助项目(No.2022C045-4);2022年度中山市第二批社会公益与基础研究项目(No.2022B2005);长春市激光制造与检测装备科技创新中心资助项目(No.2014219)。

摘　　要：为提升光学镜头的成像质量,消除杂散光的影响,以K9玻璃为基底设计可见光波段平均反射率小于0.1%的减反射膜。采用电子束离子辅助沉积的制备方式,针对薄层敏感度高、光谱变化大等问题,通过建立稳定控制膜层厚度的数学模型来减小膜厚误差,提高制备精度和成膜稳定性。对减反射膜进行环测实验,优化调整工艺参数,侧重提高减反射膜的硬度和耐水煮能力。实验结果表明,最终制备出的减反射膜在420~680 nm波段内的平均反射率约为0.044%,最高反射率为0.0712%,克服了以MgF2为外层的减反射膜机械性能和化学稳定性较差的问题,满足工程应用低损耗、稳定可靠、高强度、可重复性制备的要求。To improve the imaging quality of optical lenses and eliminate the influence of stray light,an an⁃tireflective film with an average reflectance of less than 0.1%in the visible wavelength range was designed on a K9 glass substrate.Using electron beam evaporation as the preparation method,to address the issues of high sensitivity and large spectral changes in thin films,a mathematical model was established to stabi⁃lize the control of film thickness,reduce film thickness errors,improve preparation accuracy,and film formation stability.Environmental testing experiments were conducted on the antireflective film,in which the process parameters were continuously optimized and adjusted,with a focus on improving the hardness and water boiling resistance of the antireflective film.The experimental results show that the average re⁃flectance of the prepared antireflective film is approximately 0.044%and the highest reflectance is 0.0712%in the band range of 420-680 nm.Thus,problems caused by the poor mechanical properties and chemical stability of the antireflective film with MgF2 as the outer layer are overcome.Further,the de⁃veloped film meets the requirements of low loss,stability,reliability,high strength,and repeatable prepa⁃ration in engineering applications.

关 键 词：光学薄膜 电子束蒸发镀膜 误差控制 机械性能 可见光 反射率 

分 类 号：O484[理学—固体物理]