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作 者:Peixun Fan Guochen Jiang Xinyu Hu Lizhong Wang Hongjun Zhang Minlin Zhong
出 处:《Frontiers of Optoelectronics》2023年第4期49-59,共11页光电子前沿(英文版)
基 金:support by the National Key Research and Development Program of China(No.2017YFB1104300);the National Natural Science Foundation of China(Nos.51575309 and 51210009);the Tsinghua University Initiative Scientifc Research Program(No.2018Z05JZY009).
摘 要:Controllable fabrication of surface micro/nano structures is the key to realizing surface functionalization for various applications.As a versatile approach,ultrafast laser ablation has been widely studied for surface micro/nano structuring.Increasing research eforts in this feld have been devoted to gaining more control over the fabrication processes to meet the increasing need for creation of complex structures.In this paper,we focus on the in-situ deposition process following the plasma formation under ultrafast laser ablation.From an overview perspective,we frstly summarize the diferent roles that plasma plumes,from pulsed laser ablation of solids,play in diferent laser processing approaches.Then,the distinctive in-situ deposition process within surface micro/nano structuring is highlighted.Our experimental work demonstrated that the in-situ deposition during ultrafast laser surface structuring can be controlled as a localized micro-additive process to pile up secondary ordered structures,through which a unique kind of hierarchical structure with fort-like bodies sitting on top of micro cone arrays were fabricated as a showcase.The revealed laser-matter interaction mechanism can be inspiring for the development of new ultrafast laser fabrication approaches,adding a new dimension and more fexibility in controlling the fabrication of functional surface micro/nano structures.
关 键 词:Ultrafast laser ablation Laser micro/nanofabrication Surface micro/nano structures In-situ deposition Micro-additive fabrication
分 类 号:TN24[电子电信—物理电子学]
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