InP基连续面型方形微透镜设计与制作技术研究  

Research on the Design and Manufacturing Technology of InP-Based Continuous Square Microlens

作　　者：柳聪 张为国 刘锋 崔大健[1] 张承[1] 黄晓峰[1] 高明友 刘奎宇 朱长林 陈益民 LIU Cong;ZHANG Weiguo;LIU Feng;CUI Dajian;ZHANG Cheng;HUANG Xiaofeng;GAO Mingyou;LIU Kuiyu;ZHU Changlin;CHEN Yimin(Chongqing Optoelectronics Research Institute,Chongqing 400060,CHN)

机构地区：[1]重庆光电技术研究所,重庆400060

出　　处：《半导体光电》2023年第6期883-888,共6页Semiconductor Optoelectronics

摘　　要：建立了非球面连续面型方形口径微透镜性能仿真模型,利用ZEMAX软件对10°视场、50μm周期、填充因子接近100%的磷化铟微透镜面型参数进行了优化设计。开发了衍射调制动态曝光与感应耦合等离子体刻蚀系统误差补偿方法制作出的磷化铟微透镜,其表面粗糙度小于2 nm,面型数据与设计值相比误差小于1/4工作波长,达到完善成像水平。The performance simulation model of aspheric continuous surface square aperture microlens was established in this paper.The surface parameters of InP microlens with 10°field of view,50μm period and fill factor close to 100%were optimized by ZEMAX software.A diffraction-modulated dynamic exposure and inductively coupled plasma etching system error compensation method was developed to produce InP microlens with a surface roughness of less than 2nm,and the surface shape data has an error of less than 1/4 of the working wavelength compared to the design value,achieving a complete imaging level.

关 键 词：方形微透镜 衍射调制动态曝光 填充因子 粗糙度 面型误差 

分 类 号：TN364.2[电子电信—物理电子学]