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作 者:崔吉哲 沙浩治 杨文峰 于荣 Jizhe Cui;Haozhi Sha;Wenfeng Yang;Rong Yu(School of Materials Science and Engineering,Tsinghua University,Beijing 100084,China;MOE Key Laboratory of Advanced Materials,Tsinghua University,Beijing 100084,China;State Key Laboratory of New Ceramics and Fine Processing,Tsinghua University,Beijing 100084,China)
机构地区:[1]School of Materials Science and Engineering,Tsinghua University,Beijing 100084,China [2]MOE Key Laboratory of Advanced Materials,Tsinghua University,Beijing 100084,China [3]State Key Laboratory of New Ceramics and Fine Processing,Tsinghua University,Beijing 100084,China
出 处:《Science Bulletin》2024年第4期466-472,共7页科学通报(英文版)
基 金:supported by the National Natural Science Foundation of China(52388201 and 51525102);the support from the Physical Sciences Center and Center of High-Performance Computing,Tsinghua University.
摘 要:Antiferromagnetic imaging is critical for understanding and optimizing the properties of antiferromagnetic materials and devices.Despite the widespread use of high-energy electrons for atomic-scale imaging,they have low sensitivity to spin textures.Typically,the magnetic contribution to the phase of a highenergy electron wave is weaker than one percent of the electrostatic potential.Here,we demonstrate direct imaging of antiferromagnetic lattice through precise phase retrieval via electron ptychography,paving the way for magnetic lattice imaging of antiferromagnetic materials and devices.
关 键 词:Antiferromagnetic imaging Magnetic lattice PTYCHOGRAPHY Electron microscopy
分 类 号:TM271[一般工业技术—材料科学与工程] TP391.41[电气工程—电工理论与新技术]
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