基于强流离子源的离子束溅射镀膜设备均匀性优化  

Uniformity optimization of ion beam sputtering coating equipment based on strong current ion source

作　　者：李桑丫 张艾霖 †徐欣 吕涛 王世康 罗箐[1,3] Li Sang-Ya;Zhang Ai-Lin;Xu Xin;LüTao;Wang Shi-Kang;Luo Qing(National Synchrotron Radiation Labratory,University of Science and Technology of China,Hefei 230029,China;State Key Laboratory of Particle Detection and Electronics,University of Science and Technology of China,Hefei 230031,China;School of Nuclear Science and Technology,University of Science and Technology of China,Hefei 230026,China)

机构地区：[1]中国科学技术大学,国家同步辐射实验室,合肥230029 [2]中国科学技术大学,核探测与核电子学国家重点实验室,合肥230031 [3]中国科学技术大学核科学技术学院,合肥230026

出　　处：《物理学报》2024年第5期325-333,共9页Acta Physica Sinica

基　　金：国家重点研发计划课题(批准号:2022YFA1602201);国家自然科学基金青年科学基金(批准号:12105278);中国科学技术大学学生创新创业和成果转化行动计划学生创新创业基金(批准号:CY2022G07);安徽省高等学校省级质量工程项目(批准号:2021jyxm1731);中国科学院国际伙伴计划国际大科学计划培育专项项目(批准号:211134KYSB20200057);中央高校基本科研业务费资助的课题.

摘　　要：随着高端光学器件镀膜的发展,其多样性溅射镀膜需求对离子束流流强、均匀度和可调性提出了更高的要求.对于新一代离子束溅射镀膜机来说,如何在不同离子比、不同流强的束流下保持足够的均匀度,成为了溅射镀膜设备的一大难题.本文提出了一种基于三电极引出系统的优化模拟方法,模拟和优化了离子源的引出系统,研究了等离子体电极、抑制电极、引出电极的形状、角度、距离对离子束引出性能的影响.同时,重点研究了离子比对束流引出的影响.该模型可以指导科研工作者根据离子源的状态和应用需求,对三电极引出系统的角度、距离和形状进行系统优化并找出最优解.最后,本文还给出了一种方法对混合离子束的溅射深度进行了估算.The widespread application of ion beam sputtering coating,especially in optical devices,requires the improvement of beam current intensity and uniformity of large-area uniform coatings.The advent of high current Penning sources offers a potential solution.This study introduces an automated optimization simulation method based on a three-electrode extraction system to investigate its influence on ion beam quality and uniformity.Focusing on high current intensity and uniformity,our simulation explores the effects of plasma electrode,inhibition electrode,and extraction electrode angles and distances on ion beam performance.Evaluation metrics include average beam intensity density,average energy of a single particle,and reciprocal variance of each macro particle position,which are achieved through normalization functions,allowing comprehensive comparison of simulation results.To assess coating efficiency,we estimate sputtering yield and depth.The study identifies patterns among electrodes and emphasizes the influence of different ion ratios on beam extraction.The results indicate that optimizing the angle of the plasma electrode and the distance of the suppressed electrode yields a highly uniform ion beam for low charge ions.However,for highly charged ions,similar optimization will reduce the current strength,so compensation needs to be achieved through electrode shape optimization.This research provides a model for systematically optimizing the three-electrode extraction system,guiding researchers in achieving optimal solutions based on ion source characteristics and application requirements.Additionally,we introduce a method of estimating the sputtering depth of mixed ion beams.This study provides valuable insights for advancing ion beam sputtering coating technology and reference for making the decision on design and application of ion source.

关 键 词：溅射沉积镀膜 引出系统 自动优化 束流引出模拟 

分 类 号：O53[理学—等离子体物理]