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作 者:李加飞 张析 向钢 Jiafei Li;Xi Zhang;Gang Xiang(College of Physics,Sichuan University,Chengdu 610064,China)
机构地区:[1]College of Physics,Sichuan University,Chengdu 610064,China
出 处:《Science China Materials》2024年第2期573-579,共7页中国科学(材料科学)(英文版)
基 金:supported by the National Key Research and Development Program of China(2022YFA1405100);the National Natural Science Foundation of China(52172272)。
摘 要:Ⅳ族稀磁半导体因其优异的磁电性能,以及在与当前主流半导体集成技术兼容的自旋电子器件中具有广阔的应用前景而受到越来越多的关注.事实上,具有室温铁磁性的Ⅳ族稀磁半导体及其衍生器件更有望在实际中得以应用.本工作设计并制备了基于p型(Fe,Al)共掺杂SiGe薄膜和n型Ge衬底的磁性pn二极管.磁性测量以及磁阻和反常霍尔效应测试揭示了p型(Fe,Al)共掺杂SiGe薄膜的室温铁磁性.有趣的是,磁性pn异质结表现出磁场可调的整流和磁阻行为.我们的研究结果为制备具有室温铁磁性的Ⅳ族稀磁半导体提供了一种可选策略,并为Ⅳ族稀磁半导体的实际自旋电子应用提供了范例.Group-IV diluted magnetic semiconductors(DMSs)have attracted rising attention owing to their exceptional magnetic and electrical properties and promising potential for application in spintronic devices compatible with current mainstream semiconductor integration technology.Indeed,group-IV DMSs with room-temperature ferromagnetism(RTFM)and devices derived from them are more expected for practical applications.In this work,p-type(Fe,Al)-doped SiGe thin films and pn diodes based on the p-type SiGe films and n-type Ge substrates are designed and fabricated.Magnetization characterizations,as well as magnetoresistance(MR)and anomalous Hall effect measurements,reveal RTFM in the p-type(Fe,Al)-doped SiGe thin films,in which the hole-mediated spontaneous magnetization primarily originating from Fe dopants is enhanced by holes provided by Al dopants.Interestingly,the ferromagnetic pn heterostructure exhibits magnetic field-tunable rectification and MR behaviors,especially at low temperatures,owing to the Zeeman splitting difference in the ferromagnetic p-SiGe and nonmagnetic n-Ge layers under applied magnetic fields.Our results provide an alternative strategy for fabricating group-IV DMSs with RTFM and a paradigm for practical spintronic application of group-IV DMSs.
关 键 词:diluted magnetic semiconductor SIGE pn junction RECTIFICATION MAGNETORESISTANCE
分 类 号:TN31[电子电信—物理电子学] TB383.2[一般工业技术—材料科学与工程]
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