国产EDA平台下化合物半导体工艺PDK的开发研究  

Development and research of compound semiconductor process PDK under domestic EDA platform

作　　者：贾古凯 游彬[1] 陈展飞 JIA Gukai;YOU Bin;CHEN Zhanfei(Key Laboratory for RF Circuits and Systems,Ministry of Education,Hangzhou Dianzi University,Hangzhou Zhejiang 310018,China)

机构地区：[1]杭州电子科技大学浙江省大规模集成电路设计重点实验室,浙江杭州310018

出　　处：《杭州电子科技大学学报（自然科学版）》2023年第5期21-29,共9页Journal of Hangzhou Dianzi University：Natural Sciences

摘　　要：介绍了集成电路设计中工艺设计组件(PDK)技术的研究情况,国产EDA平台下PDK发展存在的难题;详细介绍了PDK的组成部分及其应用。分析了国产EDA平台下PDK的设计难点,并提出解决方案。提出了一种基于国产EDA平台下新的整套PDK开发方式。指出采用该方法可快速地完成参数化单元(Pcell)和设计规则检查文件(DRC)的开发。进而在国产EDA平台下完成了一种化合物半导体工艺(0.15μm GaAs pHEMT工艺)PDK的开发和模型库的集成,通过单级LNA的原理图和版图设计对PDK进行验证,结果表明能确保在国产EDA平台下使用化合物半导体工艺PDK成功实现射频集成电路(RFIC)的设计。This paper introduces the research status of process design kit(PDK)technology in integrated circuit design,the difficulties existing in the development of PDK under the domestic EDA platform,and the components of PDK and its application as well in detail.The design difficulties of PDK under the domestic EDA platform are analyzed,and solutions are proposed.A new PDK development method based on the domestic EDA platform is proposed.It is pointed out that the development of parametric cell(Pcell)and design rule check file(DRC)can be completed quickly by using this method.Furthermore,the development of a compound semiconductor process(0.15μm GaAs pHEMT process)PDK and the integration of the model library were completed under the domestic EDA platform,and the PDK was verified through the schematic diagram and layout design of the single-stage LNA.Using the compound semiconductor process PDK under the EDA platform,the design of the radio frequency integrated circuit(RFIC)was realized.

关 键 词：PDK 国产EDA 工艺设计组件 射频集成电路 化合物半导体工艺 

分 类 号：TN402[电子电信—微电子学与固体电子学]