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作 者:栾玉翰 李天蔚 王旭平 郝建新 赵洪阳 付秋明[1] 陶洪 高登 马志斌[1] LUAN Yuhan;LI Tianwei;WANG Xuping;HAO Jianxin;ZHAO Hongyang;FU Qiuming;TAOHong;GAO Deng;MA Zhibin(School of Material Science and Engineering,Wuhan Institute of Technology,Wuhan 430205,China;Advanced Materials Institute,Qilu University of Technology(Shandong Academy of Science),Jinan 250000,China)
机构地区:[1]武汉工程大学材料科学与工程学院,武汉430205 [2]齐鲁工业大学(山东省科学院),新材料研究所,济南250000
出 处:《金刚石与磨料磨具工程》2024年第1期9-14,共6页Diamond & Abrasives Engineering
摘 要:采用微波等离子体化学气相沉积技术,以钽铌酸钾(KTa1-xNbxO3,简称KTN)作为衬底,生长高质量金刚石薄膜。用X射线衍射仪、扫描电子显微镜和拉曼光谱仪观察并分析金刚石薄膜的表面形貌和微观结构,并研究样品的光催化性能。结果表明:金刚石生长过程中形成了碳化钽过渡层;随着生长时间延长金刚石质量不断提高;所有样品均表现出良好的降解罗丹明B的能力,其中生长时间为12 h的样品对罗丹明B的降解效率提高了0.29倍,与生长时间为3 h的样品相比其降解效率提高了1.6倍。本研究为生长多晶金刚石提供新型衬底,并探索金刚石在光催化方面的应用。A single crystal of potassium tantalum niobate was chosen to deposit high quality diamond thin films by microwave plasma chemical vapor deposition(MPCVD)techniques.The surface morphologies and microstructures of the as-deposited diamond films were characterized by XRD,SEM,and Raman spectroscopy.The photocatalytic properties of the samples were studied.A TaC transition layer was identified during the deposition of diamond.Additionally,it was observed that as the deposition time prolonged,the quality of the diamond film improved.All film samples showed good ability to degrade Rhodamine B,with the degradation rate of the film deposited for 12 h being 0.29 times higher,corresponding to a 1.6 times greater degrading speed of Rhodamine B compared to the film deposited for 3 h.This research introduces a novel substrate for depositing polycrystalline diamond and explores its application in photocatalysis.
关 键 词:金刚石 铌酸钽钾 光催化 微波等离子体化学气相沉积(MPCVD)
分 类 号:TQ164[化学工程—高温制品工业] TG74[金属学及工艺—刀具与模具]
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