Jet formation and penetration performance of a double-layer charge liner with chemically-deposited tungsten as the inner liner  

作　　者：Bihui Hong Wenbin Li Yiming Li Zhiwei Guo Binyou Yan 

机构地区：[1]Ministerial Key Laboratory of ZNDY,Nanjing University of Science and Technology,Nanjing 210094,China [2]State Key Laboratory of Explosion Science and Technology,Beijing Institute of Technology,Beijing 100081,China [3]Xiamen Tungsten Co.,Ltd.,Xiamen 361004,China

出　　处：《Defence Technology（防务技术）》2024年第3期374-385,共12页Defence Technology

基　　金：funded by the China Postdoctoral Science Foundation(Grant No.2022M721614);the opening project of State Key Laboratory of Explosion Science and Technology,Beijing Institute of Technology(Grant No.KFJJ23-07M)。

摘　　要：This paper proposes a type of double-layer charge liner fabricated using chemical vapor deposition(CVD)that has tungsten as its inner liner.The feasibility of this design was evaluated through penetration tests.Double-layer charge liners were fabricated by using CVD to deposit tungsten layers on the inner surfaces of pure T2 copper liners.The microstructures of the tungsten layers were analyzed using a scanning electron microscope(SEM).The feasibility analysis was carried out by pulsed X-rays,slug-retrieval test and static penetration tests.The shaped charge jet forming and penetration law of inner tungsten-coated double-layer liner were studied by numerical simulation method.The results showed that the double-layer liners could form well-shaped jets.The errors between the X-ray test results and the numerical results were within 11.07%.A slug-retrieval test was found that the retrieved slug was similar to a numerically simulated slug.Compared with the traditional pure copper shaped charge jet,the penetration depth of the double-layer shaped charge liner increased by 11.4% and>10.8% respectively.In summary,the test results are good,and the numerical simulation is in good agreement with the test,which verified the feasibility of using the CVD method to fabricate double-layer charge liners with a high-density and high-strength refractory metal as the inner liner.

关 键 词：Shaped charge Chemical vapor deposition TUNGSTEN Double-layer charge liner X-ray PENETRATION 

分 类 号：TQ560.1[化学工程—炸药化工]