Plasma-exfoliated g-C_(3)N_(4) with oxygen doping: tailoring photocatalytic properties  

作　　者：Yuxin Li Junxin Guo Rui Han Zhao Wang 

机构地区：[1]National Engineering Research Centre of Industry Crystallization Technology,School of Chemical Engineering and Technology,Tianjin University,Tianjin 300072,China

出　　处：《Frontiers of Chemical Science and Engineering》2024年第2期27-39,共13页化学科学与工程前沿（英文版）

基　　金：supported by National Natural Science Foundation of China(Grant No.22278316).

摘　　要：Heteroatom doping and defect engineering have been proposed as effective ways to modulate the energy band structure and improve the photocatalytic activity of g-C_(3)N_(4). In this work, ultrathin defective g-C_(3)N_(4) was successfully prepared using cold plasma. Plasma exfoliation reduces the thickness of g-C_(3)N_(4) from 10 nm to 3 nm, while simultaneously introducing a large number of nitrogen defects and oxygen atoms into g-C_(3)N_(4). The amount of doped O was regulated by varying the time and power of the plasma treatment. Due to N vacancies, O atoms formed strong bonds with C atoms, resulting in O doping in g-C_(3)N_(4). The mechanism of plasma treatment involves oxygen etching and gas expansion. Photocatalytic experiments demonstrated that appropriate amount of O doping improved the photocatalytic degradation of rhodamine B compared with pure g-C_(3)N_(4). The introduction of O optimized the energy band structure and photoelectric properties of g-C_(3)N_(4). Active species trapping experiments revealed ·O_(2)^(–) as the main active species during the degradation.

关 键 词：graphitic carbon nitride cold plasma oxygen doping nitrogen defect visible-light photocatalysis 

分 类 号：O64[理学—物理化学]