氧化钒非制冷探测器吸收特性研究  

Study on Absorption Characteristics of VO_(x)Uncooled Detectors

作　　者：杨君 杨春丽[1] 袁俊[1] 尹树东 李华英 白兰艳 马敏 YANG Jun;YANG Chunli;YUAN Jun;YIN Shudong;LI Huaying;BAI Lanyan;MA Min(Kunming Institute of Physics,Kunming 650223,China)

机构地区：[1]昆明物理研究所,云南昆明650223

出　　处：《红外技术》2024年第3期261-268,共8页Infrared Technology

摘　　要：随着氧化钒非制冷红外焦平面的像元尺寸的减小,导致探测器的吸收面积呈边长的二次方锐减,如何提高氧化钒非制冷红外焦平面阵列的吸收效率成为一个非常关键的研究课题。本文从材料和结构角度出发,分别在单层材料吸收特性、不同吸收结构、腔体高度、膜系厚度等几个方面对影响单层、双层氧化钒非制冷探测器光学吸收的各因素进行了全面系统的仿真。通过对各因素进行量化比较,同时结合仿真结果给出了提高氧化钒非制冷探测器吸收的系统方法,对于氧化钒非制冷探测器的设计与研究具有一定的参考意义。As the pixel size of the vanadium oxide(VO_(x))uncooled infrared focal plane decreased,the absorption area of the detector exhibited a sharp quadratic decrease in the edge length.Improving the absorption efficiency of the VO_(x)uncooled infrared focal plane arrays has become a crucial research topic.In this study,a comprehensive and systematic simulation of the factors affecting the optical absorption of singlelayer and double-layer VO_(x)uncooled detectors was conducted from the aspects of material and structure,in terms of the absorption characteristics of single-layer material,different absorption structures,height of the cavity,and thickness of the film system.A systematic approach to improve the absorption of VO_(x)uncooled detectors is provided by quantitatively comparing the factors with the simulation results,which have certain reference significance for the design and research of VO_(x)uncooled detectors.

关 键 词：氧化钒非制冷探测器 吸收特性 光学仿真 膜厚分析 腔体优化 

分 类 号：TN215[电子电信—物理电子学]